SCHEMBL28074183

SCHEMBL28074183

F[P-](F)(F)(F)(F)F.N#[N+]c1ccc(Cl)cc1

nearest known ligand 0.40

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
CYP2A6 P11509 1/20 0.40
IDO1 P14902 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3469053 0.89
Hydrochloric Acid SCHEMBL19358473 0.87 LMNA (0.47) LMNACYP2A6IDO1
SCHEMBL38660753 0.87 LMNA (0.47) LMNACYP2A6IDO1
SCHEMBL10706019 0.87 LMNA (0.47) LMNACYP2A6IDO1
Hydrochloric Acid SCHEMBL1578783 0.87 LMNA (0.47) LMNACYP2A6IDO1
SCHEMBL1165343 0.85 LMNA (0.40) LMNACYP2A6IDO1
SCHEMBL11329675 0.84 LMNA (0.44) LMNACYP2A6IDO1
Phosphoric Acid SCHEMBL11318475 0.76 LMNA (0.36) LMNACYP2A6
SCHEMBL8037109 0.76 FBP1 (0.41) LMNACYP2A6
SCHEMBL28298790 0.75 MEN1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119968338-A Organic solvent sol containing hollow silica particles of amine and method for producing same 日产化学株式会社 2025-05-09 CN disclosed
CN-118055985-B Composition containing metal oxide particles with reduced production of volatile aldehydes 日产化学株式会社 2025-04-01 CN disclosed
CN-118488926-A Hollow silica particles containing aluminum atoms and method for producing same 日产化学株式会社 2024-08-13 CN disclosed
CN-118055985-A Composition containing metal oxide particles with reduced production of volatile aldehydes 日产化学株式会社 2024-05-17 CN disclosed
CN-117881628-A Epoxy group-containing organosilicon sol, epoxy resin composition, and method for producing same 日产化学株式会社 2024-04-12 CN disclosed
CN-115280190-A Anisotropic light diffusion film and display device 株式会社巴川制纸所 2022-11-01 CN disclosed
CN-110462456-B Anti-glare film and display device 株式会社巴川制纸所 2021-11-26 CN disclosed
CN-109312056-B Epoxy compound, curable composition containing same, and cured product obtained by curing curable composition JXTG能源株式会社 2021-10-01 CN disclosed
CN-109311906-B Epoxy compound, curable composition containing same, and cured product obtained by curing curable composition JXTG能源株式会社 2021-08-03 CN disclosed
CN-113072684-A Curable composition and cured product obtained by curing same JXTG能源株式会社 2021-07-06 CN disclosed
CN-109071776-B Curable composition and cured product obtained by curing same JXTG能源株式会社 2021-06-08 CN disclosed
CN-106003767-A Process for production of anisotropic optical film 株式会社巴川制纸所 2016-10-12 CN disclosed
CN-103429632-B multifunctional epoxy compound 日产化学工业株式会社 2016-07-06 CN disclosed
CN-102236125-B Method of manufacturing polymer optical waveguide NITTO DENKO CORP 2015-04-22 CN disclosed
CN-102236125-A Method of manufacturing polymer optical waveguide NITTO DENKO CORP 2011-11-09 CN disclosed