Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL28078337

COc1ccc(-c2ccccc2I)cc1.FC(F)F.S

nearest known ligand 0.51

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABL1 P00519 2/20 0.51
ABCB1 P08183 2/20 0.51
BCR P11274 2/20 0.51
HDAC4 P56524 1/20 0.46
HDAC2 Q92769 1/20 0.46
HDAC8 Q9BY41 1/20 0.46
PTPN1 P18031 1/20 0.45
MAPT P10636 6/20 0.44
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
TP53 P04637 1/20 0.44
TSHR P16473 1/20 0.44
BACE1 P56817 1/20 0.42
KMT2A Q03164 4/20 0.41
MEN1 O00255 3/20 0.41
HTR1A P08908 1/20 0.41
HTR7 P34969 1/20 0.41
LMNA P02545 2/20 0.40
MITF O75030 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4578415 0.98 ABL1 (0.53) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL145569 0.91 ABL1 (0.60) ABL1ABCB1BCRHDAC4HDAC2
Phosphonic Acid SCHEMBL27855923 0.89 HDAC4 (0.48) ABL1ABCB1BCRHDAC4HDAC2
Hydrochloric Acid SCHEMBL7696229 0.89 ABL1 (0.58) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL28505709 0.88 ABL1 (0.53) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL27493983 0.88 ABL1 (0.53) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL27533015 0.86 ABL1 (0.51) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL28244540 0.86 ABL1 (0.51) ABL1ABCB1BCRHDAC4HDAC2
Biphenyl SCHEMBL10827334 0.86 ABL1 (0.55) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL4865101 0.82 HDAC4 (0.50) ABL1ABCB1BCRHDAC4HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105849637-A photosensitive transfer material, pattern forming method and etching method 富士胶片株式会社 2016-08-10 CN disclosed