SCHEMBL145569

SCHEMBL145569

COc1ccc(-c2ccccc2I)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABL1 P00519 2/20 0.60
ABCB1 P08183 2/20 0.60
BCR P11274 2/20 0.60
HDAC4 P56524 1/20 0.53
HDAC2 Q92769 1/20 0.53
HDAC8 Q9BY41 1/20 0.53
BACE1 P56817 1/20 0.49
PTPN1 P18031 1/20 0.47
HTR1A P08908 1/20 0.46
HTR7 P34969 1/20 0.46
CA4 P22748 1/20 0.46
MAPT P10636 2/20 0.46
NPC1 O15118 1/20 0.46
TP53 P04637 1/20 0.46
TSHR P16473 1/20 0.46
RAB9A P51151 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7696229 0.98 ABL1 (0.58) ABL1ABCB1BCRHDAC4HDAC2
Biphenyl SCHEMBL10827334 0.94 ABL1 (0.55) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL4578415 0.93 ABL1 (0.53) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL28505709 0.93 ABL1 (0.53) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL27493983 0.93 ABL1 (0.53) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL28244540 0.91 ABL1 (0.51) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL27533015 0.91 ABL1 (0.51) ABL1ABCB1BCRHDAC4HDAC2
Hydrogen Sulfide SCHEMBL28078337 0.91 ABL1 (0.51) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL7574616 0.88 HDAC4 (0.51) ABL1ABCB1BCRHDAC4HDAC2
SCHEMBL4865101 0.87 HDAC4 (0.50) ABL1ABCB1BCRHDAC4HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 839 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260071353-A1 SUBSTRATES, PEPTIDE ARRAYS, AND METHODS VIBRANT HOLDINGS LLC (US) 2026-03-12 US claimed
EP-4607278-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT Ycchem Co., Ltd. (KR) 2025-08-27 EP claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 US claimed
WO-2024085293-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT 영창케미칼 주식회사 2024-04-25 WO claimed
EP-3593786-B1 PHOTOCURABLE COMPOSITION AND DENTAL RESTORATION FILLING MATERIAL TOKUYAMA DENTAL CORP (JP) 2022-05-18 EP claimed
CN-107312123-A A kind of core shell structure liquid crystal microballoon and preparation method thereof 淮安泰华新材料有限公司 2017-11-03 CN claimed
CN-105566552-A Acrylate copolymer and 248nm photoresist composition made thereof UNIV JIANGNAN 2016-05-11 CN claimed
US-9221928-B2 Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-29 US claimed
US-9075306-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US claimed
EP-2812344-A1 SUBSTRATES, PEPTIDE ARRAYS, AND METHODS Vibrant Holdings LLC (US) 2014-12-17 EP claimed
WO-2013119845-A1 SUBSTRATES, PEPTIDE ARRAYS, AND METHODS VIBRANT HOLDINGS, LLC (US) 2013-08-15 WO claimed
EP-1710230-B1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-14 EP claimed
EP-2362268-B1 Polymer, chemically amplified positive resist compositions and pattern forming process SHINETSU CHEMICAL CO (JP) 2013-01-23 EP claimed
EP-1780199-B1 Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2012-02-01 EP claimed
EP-1780198-B1 Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2011-10-05 EP claimed
CN-1997939-B Method of forming resist pattern, positive resist composition, and layered product TOKYO OHKA KOGYO CO LTD 2011-03-30 CN claimed
EP-0249139-B2 Resist compositions and use MICROSI INC (US) 1998-03-11 EP claimed
EP-0284868-B1 Photoresist compositions MICROSI INC (US) 1995-05-03 EP claimed
EP-3822278-B1 ELECTRON-ACCEPTING COMPOUND, COMPOSITION FOR CHARGE TRANSPORT FILM, AND LIGHT-EMITTING ELEMENT USING SAME MITSUBISHI CHEM CORP (JP) 2026-05-06 EP disclosed
EP-0119065-A1 Process for preparing diaryls NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) 1984-09-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260071353-A1 SUBSTRATES, PEPTIDE ARRAYS, AND METHODS VIP, CALCB, SPPL2B ABL1 2336/4885ABCB1 2850/4885BCR 1565/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.