SCHEMBL4865101

SCHEMBL4865101

COc1ccc(-c2ccccc2I)cc1.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC4 P56524 1/20 0.50
HDAC2 Q92769 1/20 0.50
HDAC8 Q9BY41 1/20 0.50
ABL1 P00519 2/20 0.47
ABCB1 P08183 2/20 0.47
BCR P11274 2/20 0.47
ACP3 P15309 1/20 0.44
POLB P06746 1/20 0.43
GAA P10253 1/20 0.43
BACE1 P56817 3/20 0.43
ABCG2 Q9UNQ0 2/20 0.42
PTPN1 P18031 1/20 0.42
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
TUBB4A P04350 1/20 0.41
TUBB P07437 1/20 0.41
TUBA3C P0DPH7 1/20 0.41
TUBA1B P68363 1/20 0.41
TUBA4A P68366 1/20 0.41
TUBB4B P68371 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL145569 0.87 ABL1 (0.60) HDAC4HDAC2HDAC8ABL1ABCB1
Hydrochloric Acid SCHEMBL7696229 0.85 ABL1 (0.58) HDAC4HDAC2HDAC8ABL1ABCB1
SCHEMBL27493983 0.83 ABL1 (0.53) HDAC4HDAC2HDAC8ABL1ABCB1
SCHEMBL28505709 0.83 ABL1 (0.53) HDAC4HDAC2HDAC8ABL1ABCB1
SCHEMBL4578415 0.83 ABL1 (0.53) HDAC4HDAC2HDAC8ABL1ABCB1
SCHEMBL2358998 0.83 BACE1 (0.46) HDAC8ACP3POLBGAABACE1
SCHEMBL7574616 0.83 HDAC4 (0.51) HDAC4HDAC2HDAC8ABL1ABCB1
SCHEMBL28244540 0.82 ABL1 (0.51) HDAC4HDAC2HDAC8ABL1ABCB1
SCHEMBL27533015 0.82 ABL1 (0.51) HDAC4HDAC2HDAC8ABL1ABCB1
Hydrogen Sulfide SCHEMBL28078337 0.82 ABL1 (0.51) HDAC4HDAC2HDAC8ABL1ABCB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7378224-B2 Method for forming pattern, and optical element JSR CORPORATION (JP) 2008-05-27 US disclosed
US-20050014100-A1 Method for forming pattern, and optical element JSR CORPORATION (JP) 2005-01-20 US disclosed
EP-1498776-A2 Method for forming pattern, and optical element JSR Corporation (JP) 2005-01-19 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed