SCHEMBL28085570

SCHEMBL28085570

C=CC(=O)Oc1cccc(OCC)c1OCC

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 3/20 0.49
THRA P10827 1/20 0.49
L3MBTL1 Q9Y468 2/20 0.42
GLA P06280 1/20 0.42
HCRTR1 O43613 2/20 0.42
ALDH1A1 P00352 3/20 0.42
NPC1 O15118 3/20 0.42
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
RAB9A P51151 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
MAPT P10636 2/20 0.42
MAPK1 P28482 1/20 0.42
TSHR P16473 2/20 0.41
KDM4E B2RXH2 1/20 0.40
HPGD P15428 1/20 0.40
HTT P42858 1/20 0.39
GAA P10253 1/20 0.39
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29636328 1.00 THRB (0.49) THRBTHRAL3MBTL1GLAHCRTR1
Propane SCHEMBL27699149 0.98 THRB (0.48) THRBTHRAL3MBTL1GLAHCRTR1
SCHEMBL28931543 0.97 THRB (0.51) THRBTHRAL3MBTL1GLAHCRTR1
SCHEMBL28119567 0.90 THRB (0.45) THRBTHRAL3MBTL1GLAHCRTR1
SCHEMBL27653204 0.85 MAPK1 (0.50) THRBTHRAHCRTR1ALDH1A1NPC1
SCHEMBL819105 0.85 THRB (0.56) THRBTHRAL3MBTL1GLAHCRTR1
SCHEMBL30197447 0.85 THRB (0.56) THRBTHRAL3MBTL1GLAHCRTR1
SCHEMBL27368123 0.85 KCNK3 (0.45) THRBTHRAL3MBTL1GLAHCRTR1
SCHEMBL10576489 0.84 THRB (0.44) THRBTHRAL3MBTL1GLAHCRTR1
SCHEMBL9064604 0.84 THRB (0.44) THRBTHRAL3MBTL1GLAHCRTR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106483760-B Photosensitive composite, its manufacturing method, the forming method of film, viscosity increase suppressing method, Photoepolymerizationinitiater initiater and its manufacturing method 东京应化工业株式会社 2019-11-12 CN disclosed
CN-104649580-B The processing method of chemically reinforced glass substrate 东京应化工业株式会社 2019-01-04 CN disclosed
CN-109134712-A Fluorenes class polyfunctionality photoinitiator, preparation method and its application 常州强力先端电子材料有限公司 2019-01-04 CN disclosed
CN-108863732-A Fluorenes based compound containing vinyl 东京应化工业株式会社 2018-11-23 CN disclosed
CN-107001497-A Colored curable resin composition 花王株式会社 2017-08-01 CN disclosed
CN-106483764-A Photosensitive composite, pattern formation method, solidfied material and display device 东京应化工业株式会社 2017-03-08 CN disclosed
CN-103764625-B Novel compound 东京应化工业株式会社 2016-08-17 CN disclosed