Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.46 |
| ▸ | MGAM | O43451 | 1/20 | 0.46 |
| ▸ | SI | P14410 | 1/20 | 0.46 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.46 |
| ▸ | CYP4F2 | P78329 | 6/20 | 0.44 |
| ▸ | CYP4A11 | Q02928 | 6/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.35 |
| ▸ | PGR | P06401 | 1/20 | 0.35 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.35 |
| ▸ | MMP8 | P22894 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28111231 | 0.89 | GAA (0.48) | GAAMGAMSIMGAM2CYP4F2 | |
| SCHEMBL28212049 | 0.86 | GAA (0.48) | GAAMGAMSIMGAM2CYP4F2 | |
| SCHEMBL28853224 | 0.85 | CYP4F2 (0.44) | GAAMGAMSIMGAM2CYP4F2 | |
| SCHEMBL30800905 | 0.83 | GAA (0.65) | GAAMGAMSIMGAM2CYP4F2 | |
| SCHEMBL6403 | 0.83 | — | — | |
| SCHEMBL122175 | 0.83 | — | — | |
| Alcohol SCHEMBL9306984 | 0.81 | GAA (0.62) | GAAMGAMSIMGAM2CYP4F2 | |
| Water SCHEMBL2542900 | 0.81 | GAA (0.62) | GAAMGAMSIMGAM2CYP4F2 | |
| Water SCHEMBL555135 | 0.81 | — | — | |
| SCHEMBL16698948 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104076606-B | A kind of photosensitive composite and its application containing oxime ester lightlike initiating agent | 常州强力电子新材料股份有限公司 | 2019-12-03 | — | — | CN | disclosed |
| CN-104749884-B | Photosensitive polymer combination | 东京应化工业株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-110317174-A | Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component | 东京应化工业株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-109962089-A | The manufacturing method of wavelength convert substrate | 东京应化工业株式会社 | 2019-07-02 | — | — | CN | disclosed |
| CN-107903156-B | Photosensitive composite and compound | 东京应化工业株式会社 | 2019-05-31 | — | — | CN | disclosed |
| CN-109581813-A | The manufacturing method of solidification compound, cured film and solidfied material | 东京应化工业株式会社 | 2019-04-05 | — | — | CN | disclosed |
| CN-109557765-A | Photosensitive polymer combination, cured film, display device and pattern forming method | 东京应化工业株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-104371372-B | Dispersible pigment dispersion, photosensitive polymer combination and dispersing aid containing the dispersible pigment dispersion | 东京应化工业株式会社 | 2019-03-19 | — | — | CN | disclosed |
| CN-103365087-B | Insulating film forms the forming method with photosensitive polymer combination, insulating film and insulating film | 东京应化工业株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-109426079-A | Photosensitive composite, solidfied material forming method, solidfied material, device used for image display panel and image display device | 东京应化工业株式会社 | 2019-03-05 | — | — | CN | disclosed |
| CN-107229184-A | Coloring photosensitive combination, staining and curing thing therefrom, the manufacture method of display element and staining and curing thing | 东京应化工业株式会社 | 2017-10-03 | — | — | CN | disclosed |
| CN-103797418-B | A kind of negative light-sensitive resin combination, pattern formation method, cured film, dielectric film, colour filter and display device | 东京应化工业株式会社 | 2017-06-13 | — | — | CN | disclosed |
| CN-106537254-A | Photosensitive composition and compound | 东京应化工业株式会社 | 2017-03-22 | — | — | CN | disclosed |
| CN-106483764-A | Photosensitive composite, pattern formation method, solidfied material and display device | 东京应化工业株式会社 | 2017-03-08 | — | — | CN | disclosed |
| CN-106371287-A | Coloured photosensitive composition | 东京应化工业株式会社 | 2017-02-01 | — | — | CN | disclosed |
| CN-106292205-A | Pattern Formation Method | 东京应化工业株式会社 | 2017-01-04 | — | — | CN | disclosed |
| CN-106256837-A | Solidification compound, the manufacture method of solidfied material and be firmly coated with material | 东京应化工业株式会社 | 2016-12-28 | — | — | CN | disclosed |
| CN-102591148-B | For the photosensitive composition of contact panel and contact panel and display device | 东京应化工业株式会社 | 2016-12-14 | — | — | CN | disclosed |
| CN-106084129-A | The solidfied material of polymerizable composition, polymerizable composition, photosensitive composite and photosensitive composite | 东京应化工业株式会社 | 2016-11-09 | — | — | CN | disclosed |
| CN-103764625-B | Novel compound | 东京应化工业株式会社 | 2016-08-17 | — | — | CN | disclosed |