SCHEMBL28089921

SCHEMBL28089921

CO[Si](CN)(OC)c1ccccc1.C[Si](Cl)(Cl)Cl

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31
NOTUM Q6P988 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5065182 0.92 LOXL2 (0.33) ESR1ESR2
SCHEMBL28178549 0.90 LOXL2 (0.32) ESR1ESR2
SCHEMBL27730885 0.81 ALDH1A1 (0.30)
SCHEMBL27822361 0.79 NPSR1 (0.31)
SCHEMBL555621 0.76 TAAR1 (0.34)
SCHEMBL1262918 0.75 CA4 (0.33) ESR1ESR2
SCHEMBL645535 0.74 CA4 (0.36) ESR1ESR2
SCHEMBL645566 0.74 CA4 (0.36) ESR1ESR2
SCHEMBL27710261 0.74 MGAM (0.32)
SCHEMBL5419647 0.74 ESR1 (0.34) ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103392221-B Curing combination for nanometer stamping, nano impression formed body and pattern formation method DIC株式会社 2016-08-10 CN disclosed