Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.34 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.34 |
| ▸ | HTR2A | P28223 | 1/20 | 0.34 |
| ▸ | HTR2C | P28335 | 1/20 | 0.34 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.34 |
| ▸ | HRH1 | P35367 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 1/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.34 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.34 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.34 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL631276 | 0.90 | CA1 (0.42) | TDP1CA1CA2CA7TSHR | |
| Acetic Acid SCHEMBL131569 | 0.82 | FFAR3 (0.39) | TDP1CA1CA2CA7TSHR | |
| Acetic Acid SCHEMBL27627871 | 0.82 | FFAR3 (0.39) | TDP1CA1CA2CA7TSHR | |
| Acrylic Acid SCHEMBL26091930 | 0.80 | LMNA (0.43) | TDP1TSHRCHRM1AKR1A1CHRM3 | |
| SCHEMBL9578457 | 0.80 | TDP1 (0.36) | TDP1CA1CA2CA7MEN1 | |
| Acetic Acid SCHEMBL667791 | 0.80 | TDP1 (0.37) | TDP1CA1CA2CA7TSHR | |
| Acetic Acid SCHEMBL8953871 | 0.80 | TDP1 (0.37) | TDP1CA1CA2CA7TSHR | |
| Acetic Acid SCHEMBL11353075 | 0.79 | CHRM1 (0.50) | TDP1CA2TSHRCHRM1AKR1A1 | |
| Acetic Acid SCHEMBL11353114 | 0.79 | CHRM1 (0.50) | TDP1CA2TSHRCHRM1AKR1A1 | |
| Ether SCHEMBL3377966 | 0.78 | CHRM1 (0.41) | TDP1TSHRCHRM1AKR1A1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024147537-A1 | RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-07-11 | — | — | WO | disclosed |
| CN-113946103-B | Dry film resist, method for manufacturing circuit wiring, input device, and display device | 富士胶片株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-112204467-B | Photosensitive transfer material, method for producing resin pattern, method for producing circuit wiring, and method for producing touch panel | 富士胶片株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-117624445-A | Acrylic polymer, photosensitive resin composition and application thereof | 合肥鼎材科技有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-111025847-B | Photosensitive resin composition, black matrix and display device | 阜阳欣奕华材料科技有限公司 | 2023-07-14 | — | — | CN | disclosed |
| CN-116149141-A | Method for producing resin pattern, method for producing conductive pattern, and laminate | 富士胶片株式会社 | 2023-05-23 | — | — | CN | disclosed |
| CN-116149134-A | Method for producing resin pattern, method for producing conductive pattern, and laminate | 富士胶片株式会社 | 2023-05-23 | — | — | CN | disclosed |
| CN-115668061-A | Pattern forming method, circuit board manufacturing method, and laminate | 富士胶片株式会社 | 2023-01-31 | — | — | CN | disclosed |
| CN-107422603-B | Photosensitive resin composition and photocured pattern produced therefrom | 东友精细化工有限公司 | 2022-03-08 | — | — | CN | disclosed |
| CN-106959585-B | Positive photosensitive transfer material and method for producing circuit wiring | 富士胶片株式会社 | 2022-02-25 | — | — | CN | disclosed |
| CN-111065973-A | Method for manufacturing circuit wiring and method for manufacturing touch panel | 富士胶片株式会社 | 2020-04-24 | — | — | CN | disclosed |
| CN-111051983-A | Positive photosensitive transfer material, method for producing same, and method for producing circuit wiring | 富士胶片株式会社 | 2020-04-21 | — | — | CN | disclosed |
| CN-110998440-A | Photosensitive resin composition, photosensitive transfer material, method for producing circuit wiring, and method for producing touch panel | 富士胶片株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-110998441-A | Photosensitive resin composition, photosensitive transfer material, method for producing circuit wiring, and method for producing touch panel | 富士胶片株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-105051608-B | Photosensitive resin composition, interlayer insulating film and method for producing same, liquid crystal display device, and organic electroluminescent display device | 富士胶片株式会社 | 2020-03-13 | — | — | CN | disclosed |
| CN-104995560-B | Photosensitive resin composition, method for producing cured film using same, cured film, liquid crystal display device, and organic EL display device | 富士胶片株式会社 | 2020-01-07 | — | — | CN | disclosed |
| CN-106716252-B | Photosensitive resin composition, cured film and method for producing same, liquid crystal display device, organic electroluminescence display device, and touch panel | 富士胶片株式会社 | 2020-01-07 | — | — | CN | disclosed |
| CN-104718498-B | Method for producing permanent film for optical material, cured film, organic EL display device, and liquid crystal display device | 富士胶片株式会社 | 2019-12-17 | — | — | CN | disclosed |
| CN-105938294-B | Negative light-sensitive resin combination | 东友精细化工有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-105938294-A | Negative photosensitive resin composition | 东友精细化工有限公司 | 2016-09-14 | — | — | CN | disclosed |