Ether

Ether

SCHEMBL3377966

CC(=O)O.CCCC(O)O.CCOCC

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Ether. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 1/20 0.41
AKR1A1 P14550 1/20 0.41
CHRM3 P20309 1/20 0.41
HTR2A P28223 1/20 0.41
HTR2C P28335 1/20 0.41
ADRA1A P35348 1/20 0.41
HRH1 P35367 1/20 0.41
DRD3 P35462 1/20 0.41
SLC6A3 Q01959 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC2 Q92769 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
TSHR P16473 3/20 0.37
ALDH1A1 P00352 2/20 0.37
CYP3A4 P08684 2/20 0.34
NFKB1 P19838 2/20 0.34
NPSR1 Q6W5P4 2/20 0.34
GPR84 Q9NQS5 7/20 0.34
FFAR1 O14842 1/20 0.34
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL28080804 0.96 CHRM1 (0.38) CHRM1AKR1A1CHRM3HTR2AHTR2C
Ether SCHEMBL107913 0.88 ALDH1A1 (0.35) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL11353114 0.88 CHRM1 (0.50) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL11353075 0.88 CHRM1 (0.50) CHRM1AKR1A1CHRM3HTR2AHTR2C
Ether SCHEMBL23130890 0.87 ALDH1A1 (0.42) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL3382899 0.86 CHRM1 (0.44) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL28196090 0.85 CHRM1 (0.48) CHRM1AKR1A1CHRM3HTR2AHTR2C
Acetic Acid SCHEMBL29215809 0.85 CHRM1 (0.48) CHRM1AKR1A1CHRM3HTR2AHTR2C
Ether SCHEMBL1786734 0.85 HSD17B10 (0.33) CHRM1AKR1A1CHRM3HTR2AHTR2C
Ethyl Acetate SCHEMBL143987 0.85 ALDH1A1 (0.56) CHRM1AKR1A1CHRM3HTR2AHTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109641430-B Photocatalyst laminate 信越化学工业株式会社 2022-03-11 CN disclosed
CN-109803826-B Laminate and method for producing same 信越化学工业株式会社 2021-05-11 CN disclosed
CN-110248750-A The manufacturing method of copper powder, resin combination, the method and solidfied material for forming solidfied material 株式会社ADEKA 2019-09-17 CN disclosed
CN-107075681-B Copper film forms the manufacturing method of the copper film with composition and using it 株式会社ADEKA 2019-04-23 CN disclosed
CN-106795630-B Copper film forms the manufacturing method of the copper film with composition and using it 株式会社ADEKA 2019-04-02 CN disclosed
CN-108250208-A Dibenzo [b] furan compound, photoelectric conversion material and photo-electric conversion element 株式会社艾迪科 2018-07-06 CN disclosed
CN-105980599-B Composition for forming copper film and method for producing copper film using same 株式会社ADEKA 2018-05-15 CN disclosed
CN-107922589-A Resin composition and cured product 株式会社ADEKA 2018-04-17 CN disclosed
CN-107614481-A The preparation of high conductivity copper film 加拿大国家研究委员会 2018-01-19 CN disclosed
CN-107075681-A Copper film formation composition and the manufacture method using its copper film 株式会社ADEKA 2017-08-18 CN disclosed
CN-106795630-A Copper film formation composition and the manufacture method using its copper film 株式会社ADEKA 2017-05-31 CN disclosed
CN-105980599-A Composition for forming copper film and method for producing copper film using same 株式会社ADEKA 2016-09-28 CN disclosed
CN-104364290-B Hardening resin composition, resin combination, resin sheet and these compositions and the solidfied material of resin sheet ADEKA株式会社 2016-09-07 CN disclosed
CN-105802487-A Actinic energy radiation-curable acrylic silicone resin composition and coated article 信越化学工业株式会社 2016-07-27 CN disclosed
CN-105009227-A OXIDE SUPERCONDUCTOR COMPOSITION, OXIDE SUPERCONDUCTOR WIRE, AND PRODUCTION METHOD FOR OXIDE SUPERCONDUCTOR WIRE INT SUPERCONDUCTIVITY TECH 2015-10-28 CN disclosed
EP-2009070-B1 Ink-jet ink and method of producing the same, color filter and method of producing the same, display device, and method of forming functional film FUJIFILM CORP (JP) 2010-11-24 EP disclosed
US-20090035535-A1 INK-JET INK AND METHOD OF PRODUCING THE SAME, COLOR FILTER AND METHOD OF PRODUCING THE SAME, DISPLAY DEVICE, AND METHOD OF FORMING FUNCTIONAL FILM FUJIFILM CORPORATION (JP) 2009-02-05 US disclosed
EP-2009070-A1 Ink-jet ink and method of producing the same, color filter and method of producing the same, display device, and method of forming functional film FUJIFILM Corporation (JP) 2008-12-31 EP disclosed