SCHEMBL2810591

SCHEMBL2810591

Cc1c(Cl)cc(S(=O)(=O)O)cc1[N+](=O)[O-]

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NSD2 O96028 1/20 0.53
GAA P10253 1/20 0.53
PLCG1 P19174 1/20 0.53
DNMT1 P26358 1/20 0.53
CASP6 P55212 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
VCAM1 P19320 11/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
MMP1 P03956 1/20 0.46
MMP2 P08253 1/20 0.46
MMP9 P14780 1/20 0.46
MMP8 P22894 1/20 0.46
MMP13 P45452 1/20 0.46
ALDH1A1 P00352 1/20 0.45
HPGD P15428 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
F2 P00734 2/20 0.43
PRSS1 P07477 2/20 0.43
PRSS2 P07478 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7513754 0.88 NSD2 (0.61) NSD2GAAPLCG1DNMT1CASP6
Hydrochloric Acid SCHEMBL10477341 0.86 NSD2 (0.59) NSD2GAAPLCG1DNMT1CASP6
SCHEMBL10477303 0.86 NSD2 (0.59) NSD2GAAPLCG1DNMT1CASP6
SCHEMBL10477302 0.86 NSD2 (0.59) NSD2GAAPLCG1DNMT1CASP6
SCHEMBL11349926 0.85 VCAM1 (0.48) VCAM1CA1CA2MMP1MMP2
SCHEMBL30741200 0.83 NSD2 (0.56) NSD2GAAPLCG1DNMT1CASP6
SCHEMBL9297794 0.83 NSD2 (0.56) NSD2GAAPLCG1DNMT1CASP6
SCHEMBL7824972 0.81 NSD2 (0.68) NSD2GAAPLCG1DNMT1CASP6
SCHEMBL10626481 0.81 NSD2 (0.58) NSD2GAAPLCG1DNMT1CASP6
SCHEMBL5369611 0.80 NSD2 (0.61) NSD2GAAPLCG1DNMT1CASP6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2053074-B1 METHOD FOR PRODUCING ACID RADICAL-CONTAINING POLYARYLENE SULFIDE RESIN DAINIPPON INK & CHEMICALS (JP) 2015-11-18 EP disclosed
US-8426552-B2 Method for producing acid group-containing polyarylene sulfide DIC CORPORATION (JP) 2013-04-23 US disclosed
CN-101501105-B Method for producing acid radical-containing polyarylene sulfide resin DAINIPPON INK & CHEMICALS 2011-01-26 CN disclosed
US-20100240863-A1 METHOD FOR PRODUCING ACID GROUP-CONTAINING POLYARYLENE SULFIDE DIC CORPORATION (JP) 2010-09-23 US disclosed
CN-101501105-A Method for producing acid radical-containing polyarylene sulfide resin DAINIPPON INK & CHEMICALS (JP) 2009-08-05 CN disclosed
EP-2053074-A1 METHOD FOR PRODUCING ACID RADICAL-CONTAINING POLYARYLENE SULFIDE RESIN DIC Corporation (JP) 2009-04-29 EP disclosed
EP-0291588-B1 SIZING AGENT KABUSHIKI KAISHA CHIYODA KAGAKU KENKYUSHO (JP) 1991-09-04 EP disclosed
US-4826570-A PARTIAL ESTER OF ALKENYL SUCCINIC ACID, PAPERMAKING KABUSHIKI KAISHA CHIYODA KAGAKU KENKYUSHO (JP) 1989-05-02 US disclosed
EP-0291588-A1 Sizing agent KABUSHIKI KAISHA CHIYODA KAGAKU KENKYUSHO (JP) 1988-11-23 EP disclosed
EP-0224976-A1 Method of sizing paper KABUSHIKI KAISHA CHIYODA KAGAKU KENKYUSHO (JP) 1987-06-10 EP disclosed