Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL28113603

O=C(O)c1ccc(-c2ccccc2)c(-c2ccccc2)c1Oc1ccccc1.S

nearest known ligand 0.44

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Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
HNF4A P41235 2/20 0.44
FOLH1 Q04609 1/20 0.39
PTPN1 P18031 1/20 0.38
XDH P47989 1/20 0.38
SLC22A12 Q96S37 1/20 0.38
POLB P06746 1/20 0.38
GSTP1 P09211 1/20 0.38
HDAC8 Q9BY41 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
FABP3 P05413 1/20 0.37
FABP4 P15090 1/20 0.37
FABP5 Q01469 1/20 0.37
SRD5A2 P31213 1/20 0.37
AKR1C3 P42330 1/20 0.37
ACMSD Q8TDX5 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Sulfide SCHEMBL28836824 0.93 HNF4A (0.44) MEN1KMT2AHNF4APTPN1POLB
SCHEMBL9630582 0.81 MEN1 (0.41) MEN1KMT2AHNF4AFOLH1PTPN1
Hydrogen Sulfide SCHEMBL28836825 0.81 PTPN1 (0.49) MEN1KMT2AHNF4APTPN1AKR1C3
SCHEMBL5798825 0.79 HNF4A (0.56) MEN1KMT2AHNF4AFABP3FABP4
SCHEMBL31114457 0.78 HNF4A (0.44) MEN1KMT2AHNF4AFOLH1PTPN1
SCHEMBL983374 0.77 PDE4B (0.46) MEN1KMT2AGSTP1HDAC8
SCHEMBL12006684 0.76 HNF4A (0.55) MEN1KMT2AHNF4AFOLH1PTPN1
SCHEMBL9217027 0.75 NCOA1 (0.43) MEN1KMT2AGSTP1
SCHEMBL8031428 0.74 ALDH1A1 (0.54) HDAC8TDP1SRD5A2AKR1C3
SCHEMBL8001214 0.73 HNF4A (0.67) HNF4AFOLH1PTPN1HDAC8FABP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106133604-B Protectant composition and protectant pattern forming method 三菱瓦斯化学株式会社 2019-09-06 CN disclosed
CN-106133604-A Protectant composition and protectant pattern forming method 三菱瓦斯化学株式会社 2016-11-16 CN disclosed