Acrylamide

Acrylamide

SCHEMBL28124376

C=CC(=O)NOC.C=CC(N)=O

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.52
ALDH1A1 P00352 3/20 0.52
FGFR4 P22455 1/20 0.52
TGM2 P21980 3/20 0.37
MAPK1 P28482 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
ZDHHC20 Q5W0Z9 1/20 0.32
ZDHHC2 Q9UIJ5 1/20 0.32
PSMB11 A5LHX3 1/20 0.31
PSMA7 O14818 1/20 0.31
PSMB1 P20618 1/20 0.31
PSMA1 P25786 1/20 0.31
PSMA2 P25787 1/20 0.31
PSMA3 P25788 1/20 0.31
PSMA4 P25789 1/20 0.31
PSMB8 P28062 1/20 0.31
PSMB9 P28065 1/20 0.31
PSMA5 P28066 1/20 0.31
PSMB4 P28070 1/20 0.31
PSMB6 P28072 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL284915 0.93
SCHEMBL28108434 0.81 TSHR (0.33) TSHRALDH1A1FGFR4TGM2MAPK1
Acrylamide SCHEMBL2357676 0.79
Acrylamide SCHEMBL106688 0.79 ALDH1A1 (0.73) TSHRALDH1A1FGFR4TGM2TDP1
SCHEMBL28040223 0.79 TSHR (0.43) TSHRALDH1A1TGM2MAPK1TDP1
Acrylamide SCHEMBL27318430 0.77 ALDH1A1 (0.61) TSHRALDH1A1FGFR4TGM2MAPK1
Acrylamide SCHEMBL27881483 0.77 ALDH1A1 (0.61) TSHRALDH1A1FGFR4TGM2MAPK1
Acrylic Acid Methyl Ester SCHEMBL11068393 0.75 ALDH1A1 (0.58) TSHRALDH1A1FGFR4TGM2MAPK1
Acrylic Acid Methyl Ester SCHEMBL9648509 0.75 ALDH1A1 (0.58) TSHRALDH1A1FGFR4TGM2MAPK1
Acrylamide SCHEMBL1094216 0.75 TSHR (0.58) TSHRALDH1A1FGFR4TGM2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106463386-A Method for polishing silicon wafer, polishing composition, and polishing composition set 福吉米株式会社 2017-02-22 CN disclosed