Pyridine

Pyridine

SCHEMBL28126188

c1ccc(CNc2ccc[nH]2)cc1.c1ccncc1

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
FABP1 P07148 1/20 0.46
FABP6 P51161 1/20 0.46
LTA4H P09960 1/20 0.44
ALDH1A1 P00352 2/20 0.42
MEN1 O00255 1/20 0.42
HPGD P15428 1/20 0.42
KMT2A Q03164 1/20 0.42
MAPKAPK2 P49137 1/20 0.41
KCNH3 Q9ULD8 1/20 0.41
MAPT P10636 1/20 0.40
F2 P00734 1/20 0.40
CXCR4 P61073 1/20 0.40
ADRA2C P18825 1/20 0.39
PKM P14618 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7260351 0.89 IDO1 (0.46) FABP1FABP6MEN1KMT2AMAPT
SCHEMBL14980560 0.75 KDM4E (0.46) ALDH1A1MEN1KMT2AMAPT
Pyridine SCHEMBL28268921 0.73 FABP1 (0.42) FABP1FABP6LTA4HALDH1A1MEN1
Pyridine SCHEMBL28290162 0.73 TSHR (0.36) ALDH1A1HPGDMAPT
Pyridine SCHEMBL28103267 0.73 TDP1 (0.36) MAPT
Pyridine SCHEMBL9737571 0.72 CYP1A2 (0.61) FABP1FABP6ALDH1A1MEN1KMT2A
Pyridine SCHEMBL28133711 0.70 HRH3 (0.50) HPGDMAPTADRA2C
Pyridine SCHEMBL28164662 0.70 ALDH1A1 (0.50) FABP1FABP6LTA4HALDH1A1MEN1
Pyridine SCHEMBL28192678 0.69 HRH3 (0.49) HPGDMAPT
N-Benzylmethylamine SCHEMBL28510182 0.69 MAPT (0.71) FABP1FABP6LTA4HALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106435660-B The method of the feature limited from copper electroplating bath foam electroplating photoresist 罗门哈斯电子材料有限责任公司 2018-09-21 CN disclosed
CN-106435660-A Method of electroplating photoresist defined features from copper electroplating baths 罗门哈斯电子材料有限责任公司 2017-02-22 CN disclosed