Benzoquinone

Benzoquinone

SCHEMBL2813316

O=C1C=CC(=O)C=C1.[N-]=[N+]=[N-]

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.67
TDP1 Q9NUW8 4/20 0.67
RECQL P46063 2/20 0.67
BCHE P06276 1/20 0.67
POLB P06746 1/20 0.67
MAOA P21397 1/20 0.67
ACHE P22303 1/20 0.67
MAOB P27338 1/20 0.67
APEX1 P27695 1/20 0.67
MAPK1 P28482 1/20 0.67
CASP1 P29466 1/20 0.67
BLM P54132 1/20 0.67
MDM2 Q00987 1/20 0.67
DHODH Q02127 1/20 0.67
HSD17B10 Q99714 1/20 0.67
APOBEC3G Q9HC16 1/20 0.67
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
CA1 P00915 2/20 0.33
MAPT P10636 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoquinone SCHEMBL27254 0.89 ALDH1A1 (0.53) ALDH1A1TDP1RECQLBCHEPOLB
Benzoquinone SCHEMBL11519889 0.87 ALDH1A1 (0.50) ALDH1A1TDP1RECQLBCHEPOLB
Benzoquinone SCHEMBL2813322 0.85 ALDH1A1 (0.57) ALDH1A1TDP1RECQLBCHEPOLB
SCHEMBL28925615 0.82
Benzoquinone SCHEMBL18103 0.82
Benzoquinone SCHEMBL10506648 0.82 ALDH1A1 (1.00) ALDH1A1TDP1RECQLBCHEPOLB
Benzoquinone SCHEMBL30679171 0.82
Benzoquinone SCHEMBL5308519 0.82 ALDH1A1 (1.00) ALDH1A1TDP1RECQLBCHEPOLB
Benzoquinone SCHEMBL460082 0.82 ALDH1A1 (1.00) ALDH1A1TDP1RECQLBCHEPOLB
Benzoquinone SCHEMBL3208089 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111640729-B Adapter plate easy for underfilling of large-size element and manufacturing method thereof 江苏长电科技股份有限公司 2023-08-18 CN claimed
WO-2012083776-A1 PHOTORESIST COMPOSITION, LED DEVICE AND METHOD OF PREPARING THE SAME BYD COMPANY LIMITED (CN) 2012-06-28 WO claimed
EP-1435544-A1 METHOD FOR FORMING IMAGE THROUGH REACTION DEVELOPMENT Yokohama TLO Company, Ltd. (JP) 2004-07-07 EP claimed
US-5518843-A NORBORNANE STRUCTURE THERMOPLASTIC RESIN JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-05-21 US claimed
JP-57184220-A None JP disclosed
JP-7013329-A None JP disclosed
JP-6059453-A None JP disclosed
JP-5289332-A None JP disclosed
JP-5249666-A None JP disclosed
JP-10133368-A None JP disclosed
JP-55005913-A None JP disclosed
JP-9043840-A None JP disclosed
EP-0544325-A1 Process for purifying vinylphenol polymers for use as photoresist materials MARUZEN PETROCHEMICAL CO., LTD. (JP) 1993-06-02 EP disclosed
US-4740450-A COATING WITH PHOTOSENSITIVE LAYER CONTAINING SCRATCH IMPROVER; DRYING, MIGRATION TOYO BOSEKI KABUSHIKI KAISHA (JP) 1988-04-26 US disclosed
JP-S62255937-A POSITIVE TYPE PHOTORESIST COMPOSITION UBE IND LTD 1987-11-07 JP disclosed
JP-S62105421-A FORMATION OF ELECTRODE FOR SEMICONDUCTOR DEVICE AGENCY OF IND SCIENCE & TECHNOL 1987-05-15 JP disclosed
US-4379830-A Developer for positive photolithographic articles POLYCHROME CORPORATION (US) 1983-04-12 US disclosed
JP-S57184220-A PROTECTIVE METHOD FOR CONFORMING MARK WITH EYE IN MANUFACTURE OF SEMICONDUCTOR DEVICE NEC CORP 1982-11-12 JP disclosed
JP-S555913-A PHOTOCHEMICALLY REACTIVE FORMED MATERIAL TORAY IND INC 1980-01-17 JP disclosed
JP-H00943840-A 0001-01-01 JP disclosed