Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.53 |
| ▸ | BCHE | P06276 | 1/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.53 |
| ▸ | MAOA | P21397 | 1/20 | 0.53 |
| ▸ | ACHE | P22303 | 1/20 | 0.53 |
| ▸ | MAOB | P27338 | 1/20 | 0.53 |
| ▸ | APEX1 | P27695 | 1/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.53 |
| ▸ | CASP1 | P29466 | 1/20 | 0.53 |
| ▸ | RECQL | P46063 | 1/20 | 0.53 |
| ▸ | BLM | P54132 | 1/20 | 0.53 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.53 |
| ▸ | DHODH | Q02127 | 1/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA6 | P23280 | 1/20 | 0.40 |
| ▸ | CA5A | P35218 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoquinone SCHEMBL11519889 | 0.97 | ALDH1A1 (0.50) | ALDH1A1BCHEPOLBMAOAACHE | |
| Benzoquinone SCHEMBL2813322 | 0.97 | ALDH1A1 (0.57) | ALDH1A1BCHEPOLBMAOAACHE | |
| Benzoquinone SCHEMBL2813316 | 0.89 | ALDH1A1 (0.67) | ALDH1A1BCHEPOLBMAOAACHE | |
| Benzoquinone SCHEMBL6318381 | 0.89 | ALDH1A1 (0.42) | ALDH1A1BCHEPOLBMAOAACHE | |
| SCHEMBL8906167 | 0.85 | ALDH1A1 (0.37) | ALDH1A1BCHEPOLBMAOAACHE | |
| Benzoquinone SCHEMBL8626462 | 0.83 | ALDH1A1 (0.36) | ALDH1A1BCHEPOLBMAOAACHE | |
| Benzoquinone SCHEMBL8864479 | 0.81 | ALDH1A1 (0.35) | ALDH1A1BCHEPOLBMAOAACHE | |
| SCHEMBL204008 | 0.75 | CA1 (0.35) | CA1CA6CA5ACA9CA5B | |
| SCHEMBL28925615 | 0.73 | — | — | |
| Benzoquinone SCHEMBL10506648 | 0.73 | ALDH1A1 (1.00) | ALDH1A1BCHEPOLBMAOAACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4590 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260047474-A1 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-02-12 | — | — | US | claimed |
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | claimed |
| CN-114902135-B | Positive photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2024-07-02 | — | — | CN | claimed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | claimed |
| WO-2024135082-A1 | WIRING BOARD, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING LIGHT-BLOCKING LAYER, LIGHT-BLOCKING LAYER TRANSFER FILM, AND WIRING BOARD MANUFACTURING METHOD | 東レ株式会社 | 2024-06-27 | — | — | WO | claimed |
| CN-113661583-B | Display apparatus | 夏普株式会社 | 2024-06-18 | — | — | CN | claimed |
| WO-2024122542-A1 | PHOTOSENSITIVE RESIN COMPOSITION, RESIN FILM HAVING PATTERN, PRODUCTION METHOD FOR SAME, AND SEMICONDUCTOR CIRCUIT BOARD | JSR株式会社 | 2024-06-13 | — | — | WO | claimed |
| WO-2024101411-A1 | CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER | JSR株式会社 | 2024-05-16 | — | — | WO | claimed |
| CN-111538209-B | Photosensitive resin composition, organic EL element partition wall, and organic EL element | 日保丽公司 | 2024-05-14 | — | — | CN | claimed |
| CN-118020025-A | Photosensitive resin composition, cured product, organic EL display device, semiconductor device, and method for producing cured product | 东丽株式会社 | 2024-05-10 | — | — | CN | claimed |
| EP-0024916-A2 | Improved positive-working resist materials and their use in a formation of a negative resist pattern on a substrate | FUJITSU LIMITED (JP) | 1981-03-11 | — | — | EP | claimed |
| EP-0023758-A1 | Stabilised developer concentrates and developers containing a quaternary alkanol ammonium hydroxide | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1981-02-11 | — | — | EP | claimed |
| US-4250242-A | GRADIENT IN COATING OF QUINONE DIAZIDE ON SURFACE OF PHOTODEGRADABLE SUPPORT | AMERICAN HOECHST CORPORATION (US) | 1981-02-10 | — | — | US | claimed |
| EP-0002105-B1 | PROCESS FOR INCREASING THE SOLUBILITY RATE RATIO OF A POSITIVE-WORKING RESIST | International Business Machines Corporation (US) | 1981-01-14 | — | — | EP | claimed |
| US-4191573-A | O-QUINONE DIAZIDE, AN ALKALI-SOLUBLE ARYL AZIDE, A POLYAMIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1980-03-04 | — | — | US | claimed |
| US-4191569-A | Treating developed lithoplate with oleophilic composition | VICKERS LIMITED (GB) | 1980-03-04 | — | — | US | claimed |
| US-4154613-A | Positive-acting diazo type materials having photodecomposed gradient | AMERICAN HOECHST CORPORATION (US) | 1979-05-15 | — | — | US | claimed |
| US-4152158-A | Electrochemically treated photo-lithographic plates | POLYCHROME CORPORATION (US) | 1979-05-01 | — | — | US | claimed |
| US-4141733-A | Development of light-sensitive quinone diazide compositions | EASTMAN KODAK COMPANY (US) | 1979-02-27 | — | — | US | claimed |
| US-4125650-A | Resist image hardening process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1978-11-14 | — | — | US | claimed |