⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10025630 | 0.88 | — | — | |
| SCHEMBL13716082 | 0.88 | — | — | |
| SCHEMBL2741167 | 0.85 | — | — | |
| SCHEMBL17166507 | 0.81 | CHRM2 (0.33) | — | |
| SCHEMBL13906719 | 0.81 | — | — | |
| SCHEMBL12256183 | 0.79 | — | — | |
| SCHEMBL14707444 | 0.79 | — | — | |
| SCHEMBL2809457 | 0.76 | — | — | |
| SCHEMBL2741166 | 0.75 | — | — | |
| SCHEMBL12309106 | 0.75 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120003589-A1 | POLYMER FOR FORMING RESIST PROTECTION FILM, COMPOSITION FOR FORMING RESIST PROTECTION FILM, AND METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICES USING THE COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2012-01-05 | — | — | US | disclosed |