SCHEMBL13906719

SCHEMBL13906719

C=CC(=O)OC1CC2CC1CC2C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2813931 0.81 — —
SCHEMBL13879031 0.80 ATM (0.38) —
SCHEMBL17166507 0.80 CHRM2 (0.33) —
SCHEMBL10025630 0.78 — —
SCHEMBL13716082 0.78 — —
SCHEMBL12256183 0.78 — —
SCHEMBL14707444 0.78 — —
SCHEMBL23963452 0.76 ALDH1A1 (0.31) —
SCHEMBL525959 0.76 — —
SCHEMBL75086 0.76 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090061360-A1 MATERIAL FOR RESIST PROTECTIVE FILM FOR IMMERSION LITHOGRAPHY ASAHI GLASS COMPANY, LIMITED (JP) 2009-03-05 — — US disclosed
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