SCHEMBL2816133

SCHEMBL2816133

c1ccc(-c2nc[nH]n2)nc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 10/20 0.56
TDP1 Q9NUW8 4/20 0.56
TP53 P04637 3/20 0.56
LMNA P02545 3/20 0.52
CCR1 P32246 2/20 0.52
CCR5 P51681 2/20 0.52
CCR8 P51685 2/20 0.52
CYP1A2 P05177 1/20 0.52
POLB P06746 1/20 0.52
METAP1 P53582 1/20 0.52
BLM P54132 1/20 0.52
HIF1A Q16665 1/20 0.52
DOHH Q9BU89 1/20 0.52
P4HTM Q9NXG6 1/20 0.52
NPC1 O15118 6/20 0.52
RAB9A P51151 6/20 0.52
L3MBTL1 Q9Y468 5/20 0.52
SMN1; SMN2 Q16637 5/20 0.52
ALOX15 P16050 4/20 0.52
ALPL P05186 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1963283 0.78 TDP1 (0.38) KDM4ETDP1TP53LMNACCR1
SCHEMBL10759273 0.75 CLK4 (0.32)
SCHEMBL31268013 0.74 KDM4E (0.75) KDM4ETDP1TP53LMNACCR1
SCHEMBL580823 0.74 KDM4E (0.75) KDM4ETDP1TP53LMNACCR1
SCHEMBL29767699 0.72 TP53 (1.00) KDM4ETDP1TP53LMNACCR1
SCHEMBL30694104 0.72 TP53 (1.00) KDM4ETDP1TP53LMNACCR1
SCHEMBL322756 0.72 KDM4E (1.00) KDM4ETDP1TP53LMNACCR1
Hydrochloric Acid SCHEMBL28577751 0.72 KDM4E (0.71) KDM4ETDP1TP53LMNACCR1
SCHEMBL2852298 0.72 TP53 (1.00) KDM4ETDP1TP53LMNACCR1
SCHEMBL29354466 0.72 KDM4E (1.00) KDM4ETDP1TP53LMNACCR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122059983-A Reductive silanization method of nickel-catalyzed alpha-benzoylalkyl bromide and chlorosilane on activated olefin 大连理工大学 2026-05-19 CN claimed
WO-2025217208-A1 CHEMICAL MECHANICAL PLANARIZATION POLISHING FOR INTERCONNECTS DIFFUSION BARRIER MATERIALS VERSUM MATERIALS US, LLC (US) 2025-10-16 WO claimed
CN-118126342-B Coordination polymer based on pyridine carboxylic acid and preparation method and application thereof 湖南工学院 2025-02-18 CN claimed
CN-118005946-B Iodized 3- (2-pyridyl) -1,2, 4-triazole coordination polymer and preparation method and application thereof 衡阳师范学院 2024-10-11 CN claimed
CN-118126342-A Coordination polymer based on pyridine carboxylic acid and preparation method and application thereof 湖南工学院 2024-06-04 CN claimed
CN-118005946-A Iodized 3- (2-pyridyl) -1,2, 4-triazole coordination polymer and preparation method and application thereof 衡阳师范学院 2024-05-10 CN claimed
CN-112300405-B Copper coordination polymer and preparation method, crystal and application thereof 湖南工学院 2022-03-22 CN claimed
EP-3891234-A1 COMPOSITION AND METHOD FOR COPPER BARRIER CMP CMC Materials, Inc. (US) 2021-10-13 EP claimed
EP-3891237-A1 COMPOSITION AND METHOD FOR COBALT CMP CMC Materials, Inc. (US) 2021-10-13 EP claimed
CN-113396197-A Compositions and methods for chemical mechanical polishing of copper barriers CMC材料股份有限公司 2021-09-14 CN claimed
US-10988635-B2 Composition and method for copper barrier CMP CMC MATERIALS, INC. (US) 2021-04-27 US claimed
CN-112382684-A Transparent solar glass panel with luminescent solar concentrator nanomaterial coating 希腊布莱特公司 2021-02-19 CN claimed
CN-112300405-A Copper coordination polymer and preparation method, crystal and application thereof 湖南工学院 2021-02-02 CN claimed
WO-2020117438-A1 COMPOSITION AND METHOD FOR COBALT CMP CABOT MICROELECTRONICS CORPORATION (US) 2020-06-11 WO claimed
WO-2020117441-A1 COMPOSITION AND METHOD FOR COPPER BARRIER CMP CABOT MICROELECTRONICS CORPORATION (US) 2020-06-11 WO claimed
US-20200172762-A1 COMPOSITION AND METHOD FOR COPPER BARRIER CMP CMC MATERIALS LLC 2020-06-04 US claimed
CN-108690059-B Preparation method of luminescent crystal material capable of selectively detecting Cu (II) and luminescent crystal material thereof 江南大学 2020-04-10 CN claimed
CN-109053690-A Bipolarity electroluminescent material and its application containing carbazole group 大连理工大学 2018-12-21 CN claimed
CN-108912154-A A kind of substrate being used to prepare bipolarity electroluminescent material 大连理工大学 2018-11-30 CN claimed
CN-108752372-A A kind of compound being used to prepare electroluminescent organic material 大连理工大学 2018-11-06 CN claimed