⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13423389 | 0.97 | — | — | |
| SCHEMBL7300548 | 0.82 | — | — | |
| SCHEMBL7860878 | 0.71 | — | — | |
| SCHEMBL4753433 | 0.69 | — | — | |
| SCHEMBL12133980 | 0.67 | GAA (0.35) | — | |
| SCHEMBL12132661 | 0.67 | CES1 (0.48) | — | |
| SCHEMBL27414 | 0.67 | — | — | |
| SCHEMBL14273905 | 0.67 | — | — | |
| SCHEMBL5859820 | 0.67 | CA2 (0.30) | — | |
| SCHEMBL13344073 | 0.65 | CA2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8536280-B2 | Star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-8536280-B2 | Star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-8536280-B2 | Star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20100248144-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100056748-A1 | Novel star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20100056748-A1 | Novel star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20100056748-A1 | Novel star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20100055606-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2010-03-04 | — | — | US | disclosed |
| US-20100055606-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2010-03-04 | — | — | US | disclosed |
| US-20100055606-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2010-03-04 | — | — | US | disclosed |