Hydrazine

Hydrazine

SCHEMBL28166174

NN.NNS(=O)(=O)c1ccccc1

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.56
CA2 P00918 3/20 0.56
MMP2 P08253 2/20 0.56
MMP1 P03956 1/20 0.56
MMP9 P14780 1/20 0.56
MMP8 P22894 1/20 0.56
MMP13 P45452 1/20 0.56
KEAP1 Q14145 3/20 0.54
IL1RN P18510 1/20 0.54
ERAP1 Q9NZ08 1/20 0.54
CA12 O43570 3/20 0.50
CA9 Q16790 3/20 0.50
ALDH1A1 P00352 3/20 0.50
CA14 Q9ULX7 2/20 0.50
PKM P14618 2/20 0.50
CA3 P07451 1/20 0.50
CA4 P22748 1/20 0.50
CA6 P23280 1/20 0.50
CA5A P35218 1/20 0.50
CA7 P43166 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1109 0.97 CA1 (0.58) CA1CA2MMP2MMP1MMP9
SCHEMBL30724544 0.97 CA1 (0.58) CA1CA2MMP2MMP1MMP9
Water SCHEMBL1434222 0.95 CA1 (0.56) CA1CA2MMP2MMP1MMP9
SCHEMBL29171225 0.95 CA1 (0.56) CA1CA2MMP2MMP1MMP9
SCHEMBL28202553 0.95 CA1 (0.56) CA1CA2MMP2MMP1MMP9
Hydrochloric Acid SCHEMBL4638988 0.95 CA1 (0.56) CA1CA2MMP2MMP1MMP9
SCHEMBL29171227 0.95 CA1 (0.56) CA1CA2MMP2MMP1MMP9
Potassium SCHEMBL30724545 0.95 CA1 (0.56) CA1CA2MMP2MMP1MMP9
(Phenylsulfonyl)Benzene SCHEMBL28304808 0.91 HTR6 (0.64) CA1CA2MMP2MMP1MMP9
Dimethylamine SCHEMBL6257995 0.91 CA2 (0.52) CA1CA2MMP2MMP1MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107001550-B Novolak phenolics, its manufacturing method, photosensitive composite, erosion resistant and film DIC株式会社 2019-04-02 CN disclosed
CN-107001550-A Novolak phenolics, its manufacture method, photosensitive composite, erosion resistant and film DIC株式会社 2017-08-01 CN disclosed
CN-107003612-A Resist lower membrane formation photosensitive composite and resist lower membrane DIC株式会社 2017-08-01 CN disclosed