SCHEMBL28171522

SCHEMBL28171522

CC(C)c1ccc(-c2cc(-c3ccc(C(C)C)cc3)n(-c3ccc(C(C)C)cc3)n2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ BCL2 P10415 2/20 0.52
▸ MDM2 Q00987 2/20 0.52
▸ MCL1 Q07820 2/20 0.52
▸ PTGS2 P35354 9/20 0.50
▸ FABP3 P05413 1/20 0.50
▸ FABP4 P15090 1/20 0.50
▸ CYP2C9 P11712 2/20 0.48
▸ KCNH2 Q12809 2/20 0.47
▸ PTGS1 P23219 2/20 0.47
▸ RARA P10276 1/20 0.47
▸ RARB P10826 1/20 0.47
▸ RARG P13631 1/20 0.47
▸ RXRA P19793 1/20 0.47
▸ NPC1 O15118 2/20 0.45
▸ MAPT P10636 2/20 0.45
▸ RAB9A P51151 2/20 0.45
▸ SMN1; SMN2 Q16637 2/20 0.45
▸ LMNA P02545 1/20 0.45
▸ TSHR P16473 1/20 0.45
▸ L3MBTL1 Q9Y468 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14400630 0.81 SMN1; SMN2 (0.67) PTGS2CYP2C9KCNH2PTGS1NPC1
Quinoline SCHEMBL28171300 0.80 FABP3 (0.51) BCL2MDM2MCL1FABP3FABP4
SCHEMBL8297120 0.78 SMN1; SMN2 (0.75) PTGS2CYP2C9KCNH2PTGS1NPC1
SCHEMBL5216095 0.77 PTGS2 (0.60) PTGS2CYP2C9PTGS1RARGRXRA
SCHEMBL16432877 0.77 CYP2C9 (0.62) MCL1CYP2C9PTGS1NPC1MAPT
SCHEMBL10038494 0.77 CYP2C9 (0.62) MCL1CYP2C9PTGS1NPC1MAPT
SCHEMBL28180312 0.77 MDM2 (0.81) BCL2MDM2MCL1SMN1; SMN2L3MBTL1
SCHEMBL5214995 0.77 PTGS2 (0.67) PTGS2FABP3FABP4CYP2C9PTGS1
SCHEMBL3852411 0.75 RAB9A (0.62) MCL1FABP3FABP4CYP2C9PTGS1
SCHEMBL8303452 0.75 SMN1; SMN2 (0.66) PTGS2CYP2C9PTGS1NPC1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107422606-A The manufacture method of photosensitive element, the forming method of corrosion-resisting pattern and printed wiring board 日立化成株式会社 2017-12-01 — — CN disclosed
CN-107367903-A The manufacture method of photosensitive element, the forming method of corrosion-resisting pattern and printed wiring board 日立化成株式会社 2017-11-21 — — CN disclosed
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