SCHEMBL28173573

SCHEMBL28173573

Cc1c(C(=O)O)ccc(N2CCc3ccccc32)c1C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOTUM Q6P988 1/20 0.43
KMT2A Q03164 3/20 0.42
MEN1 O00255 2/20 0.42
SRD5A1 P18405 1/20 0.42
ALDH1A1 P00352 5/20 0.41
HPGD P15428 2/20 0.41
MAPT P10636 3/20 0.41
NPC1 O15118 3/20 0.41
RAB9A P51151 3/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
GRM1 Q13255 1/20 0.40
MAPK1 P28482 2/20 0.40
TP53 P04637 1/20 0.40
PKM P14618 1/20 0.40
TSHR P16473 1/20 0.40
MYC P01106 1/20 0.40
GAA P10253 1/20 0.40
KDM4E B2RXH2 1/20 0.40
POLB P06746 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28341426 0.83 NPC1 (0.48) NOTUMKMT2AMEN1SRD5A1ALDH1A1
SCHEMBL6715699 0.79 NPC1 (0.53) NOTUMKMT2AMEN1SRD5A1ALDH1A1
SCHEMBL27446749 0.72 POLB (0.48) KMT2AMEN1ALDH1A1MAPTNPC1
SCHEMBL13890895 0.71 NPC1 (0.48) NOTUMKMT2AMEN1ALDH1A1HPGD
SCHEMBL10625670 0.71 SMN1; SMN2 (0.54) NOTUMKMT2AMEN1ALDH1A1HPGD
Benzene SCHEMBL27642991 0.70 HTR6 (0.48) ALDH1A1TSHRKDM4E
SCHEMBL28199285 0.69 POLB (0.43) ALDH1A1HPGDSMN1; SMN2L3MBTL1TP53
SCHEMBL25026229 0.69 ALDH1A1 (0.55) NOTUMKMT2AMEN1SRD5A1ALDH1A1
SCHEMBL156641 0.69 MEN1 (0.57) NOTUMKMT2AMEN1ALDH1A1HPGD
SCHEMBL27442187 0.69 SMN1; SMN2 (0.49) KMT2AMEN1ALDH1A1HPGDRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104837849-B Ligand compound, process for producing the same, transition metal compound, and process for producing the same 株式会社LG化学 2017-09-22 CN disclosed