SCHEMBL28183003

SCHEMBL28183003

ClNCCC1CCCCC1.[SiH4]

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 5/20 0.43
EPHX1 P07099 1/20 0.42
CYP1A2 P05177 1/20 0.41
KDM1A O60341 3/20 0.37
MAOA P21397 3/20 0.37
MAOB P27338 3/20 0.37
HPGD P15428 1/20 0.36
CA2 P00918 1/20 0.33
ADH1B P00325 1/20 0.33
ADH1C P00326 1/20 0.33
ADH1A P07327 1/20 0.33
ADH4 P08319 1/20 0.33
ADH7 P40394 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
BCHE P06276 1/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6061501 0.97 SIGMAR1 (0.45) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL716430 0.76 SIGMAR1 (0.48) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL17086068 0.73
SCHEMBL3836071 0.72 SIGMAR1 (0.45) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL22520986 0.72 SIGMAR1 (0.68) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL629800 0.72 SIGMAR1 (0.68) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL22838527 0.72 SIGMAR1 (0.68) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL22341229 0.72 SIGMAR1 (0.68) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL6247127 0.72 SIGMAR1 (0.45) SIGMAR1EPHX1CYP1A2KDM1AMAOA
SCHEMBL19355233 0.72 SIGMAR1 (0.68) SIGMAR1EPHX1CYP1A2KDM1AMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107312028-A Halogenated organoaminosilane precursors and methods of depositing thin films comprising the same 弗萨姆材料美国有限责任公司 2017-11-03 CN claimed
CN-107857774-A Halogenated organoaminosilane precursors and methods of depositing thin films comprising the same 弗萨姆材料美国有限责任公司 2018-03-30 CN disclosed
CN-107312028-A Halogenated organoaminosilane precursors and methods of depositing thin films comprising the same 弗萨姆材料美国有限责任公司 2017-11-03 CN disclosed