SCHEMBL2820516

SCHEMBL2820516

[CH2]CCCC(C)(C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4621459 0.82
SCHEMBL5986398 0.81
SCHEMBL6060603 0.79 FFAR1 (0.31)
SCHEMBL11253599 0.76
SCHEMBL21499420 0.76
SCHEMBL598014 0.74 TSHR (0.33)
SCHEMBL5368748 0.74 SMN1; SMN2 (0.38)
SCHEMBL11489442 0.74 RIPK1 (0.33)
SCHEMBL18584349 0.72 TSHR (0.37)
SCHEMBL13741585 0.72 NFKB1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110998437-A Multi-trigger photoresist compositions and methods A·P·G·罗宾森 2020-04-10 CN disclosed
US-8604233-B2 Lubricant composition, magnetic recording medium, and novel polyether compound FUJIFILM CORPORATION (JP) 2013-12-10 US disclosed
US-20100247971-A1 LUBRICANT COMPOSITION, MAGNETIC RECORDING MEDIUM, AND NOVEL POLYETHER COMPOUND FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed