SCHEMBL28209079

SCHEMBL28209079

Nn1ccc(-c2ccco2)n1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 6/20 0.49
MAPT P10636 3/20 0.46
HSD17B10 Q99714 3/20 0.46
KDM4E B2RXH2 4/20 0.44
ALDH1A1 P00352 3/20 0.44
BLM P54132 2/20 0.44
ADORA2A P29274 4/20 0.44
ADORA1 P30542 3/20 0.44
MAPK1 P28482 1/20 0.44
PTGS2 P35354 1/20 0.42
POLB P06746 2/20 0.42
MEN1 O00255 1/20 0.42
USP2 O75604 1/20 0.42
LMNA P02545 1/20 0.42
THRB P10828 1/20 0.42
PKM P14618 1/20 0.42
HPGD P15428 1/20 0.42
ALOX15 P16050 1/20 0.42
ALOX12 P18054 1/20 0.42
CASP1 P29466 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10201593 0.78 KMT2A (0.48) PTGS1MAPTHSD17B10KDM4EALDH1A1
SCHEMBL27544952 0.77 PTGS1 (0.45) PTGS1MAPTHSD17B10KDM4EALDH1A1
SCHEMBL22349827 0.73 PTGS1 (0.46) PTGS1MAPTHSD17B10KDM4EALDH1A1
SCHEMBL22349826 0.73 ALDH1A1 (0.49) PTGS1MAPTHSD17B10KDM4EALDH1A1
SCHEMBL14299871 0.72 PTK2 (0.41) POLBMEN1LMNAPKMKMT2A
SCHEMBL13528568 0.68 ALDH1A1 (0.68) MAPTHSD17B10KDM4EALDH1A1BLM
SCHEMBL7093584 0.67 ADORA3 (0.46) PTGS1MAPTHSD17B10KDM4EALDH1A1
SCHEMBL17397928 0.67 KMT2A (0.59) MAPTHSD17B10KDM4EALDH1A1ADORA2A
SCHEMBL13714579 0.67 ADORA2A (0.57) PTGS1MAPTHSD17B10KDM4EALDH1A1
SCHEMBL10808940 0.66 KDM4E (0.59) PTGS1MAPTHSD17B10KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107922787-B Use of Chemical Mechanical Polishing (CMP) compositions for polishing cobalt-containing substrates 巴斯夫欧洲公司 2021-06-29 CN disclosed
CN-111356747-A Chemical mechanical polishing composition 巴斯夫欧洲公司 2020-06-30 CN disclosed
CN-107922787-A Use of Chemical Mechanical Polishing (CMP) compositions for polishing cobalt-containing substrates 巴斯夫欧洲公司 2018-04-17 CN disclosed