Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL227643 | 0.95 | TSHR (0.47) | TSHRTHRBPOLBGAAALDH1A1 | |
| SCHEMBL9821068 | 0.90 | TSHR (0.43) | TSHRTHRBPOLBGAAALDH1A1 | |
| SCHEMBL9820817 | 0.87 | TSHR (0.41) | TSHRTHRBPOLBGAAALDH1A1 | |
| SCHEMBL29960212 | 0.85 | TSHR (0.35) | TSHRTHRBPOLBGAAALDH1A1 | |
| SCHEMBL9242879 | 0.84 | ALDH1A1 (0.41) | TSHRTHRBPOLBGAAALDH1A1 | |
| SCHEMBL11691380 | 0.82 | TSHR (0.50) | TSHRTHRBPOLBGAAALDH1A1 | |
| Methacrylic Acid SCHEMBL7207924 | 0.82 | TSHR (0.44) | TSHRTHRBPOLBALDH1A1MEN1 | |
| Acrylic Acid Methyl Ester SCHEMBL28209123 | 0.82 | TSHR (0.37) | TSHRTHRBPOLBGAAALDH1A1 | |
| SCHEMBL12912839 | 0.81 | TSHR (0.42) | TSHRTHRBPOLBGAAALDH1A1 | |
| SCHEMBL8325291 | 0.81 | TSHR (0.44) | TSHRTHRBPOLBGAAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105593950-B | Photosensitive conductive film, used the photosensitive conductive film conductive pattern forming method and conductive pattern substrate | 日立化成株式会社 | 2018-04-13 | — | — | CN | disclosed |