SCHEMBL28218960

SCHEMBL28218960

O=Cc1cnc(C=O)n1I

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3953092 0.59
SCHEMBL13080930 0.59
SCHEMBL858846 0.59
SCHEMBL3914396 0.58
SCHEMBL9638546 0.58
SCHEMBL12232255 0.58
SCHEMBL1778393 0.55 TRIM24 (0.36) ALDH1A1
SCHEMBL4033439 0.55 TRIM24 (0.32) ALDH1A1
SCHEMBL5896401 0.55 PTGER4 (0.36) ALDH1A1
SCHEMBL13467083 0.55 PTGER4 (0.36) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108137478-A Compound, resin, resist composition or radiation-sensitive composition, method for forming resist pattern, method for producing amorphous film, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for forming circuit pattern, and purification method 三菱瓦斯化学株式会社 2018-06-08 CN disclosed