SCHEMBL28229302

SCHEMBL28229302

Cc1ccccc1-c1cccc2nc3ccccc3cc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.53
▸ HPGD P15428 3/20 0.53
▸ GLA P06280 2/20 0.53
▸ KDM4E B2RXH2 2/20 0.53
▸ GAA P10253 2/20 0.53
▸ NPC1 O15118 1/20 0.53
▸ LMNA P02545 1/20 0.53
▸ POLB P06746 1/20 0.53
▸ PTBP1 P26599 1/20 0.53
▸ RAB9A P51151 1/20 0.53
▸ KMT2A Q03164 1/20 0.53
▸ RCE1 Q9Y256 1/20 0.53
▸ MAPT P10636 1/20 0.48
▸ ACHE P22303 1/20 0.48
▸ PDE10A Q9Y233 1/20 0.47
▸ ADORA2A P29274 1/20 0.46
▸ MBNL1 Q9NR56 1/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ AR P10275 1/20 0.44
▸ CYP1A2 P05177 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4014126 0.89 KMT2A (0.64) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL29376451 0.85 ALDH1A1 (0.60) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL291182 0.85 ALDH1A1 (0.60) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL1187275 0.83 ALDH1A1 (0.58) ALDH1A1HPGDGLAKDM4EGAA
Hydrochloric Acid SCHEMBL28881738 0.83 ALDH1A1 (0.58) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL1187919 0.81 ALDH1A1 (0.56) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL29664592 0.81 ALDH1A1 (0.49) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL10010909 0.81 ALDH1A1 (0.49) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL28917948 0.80 ALDH1A1 (0.55) ALDH1A1HPGDGLAKDM4EGAA
SCHEMBL1122659 0.79 ALDH1A1 (0.58) ALDH1A1HPGDGLAKDM4EGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109298597-A The photosensitive polymer combination and application that a kind of better photosensitivity and anti-plate are had excellent performance 浙江福斯特新材料研究院有限公司 2019-02-01 — — CN disclosed
CN-108205240-A Photosensitive resin composition with high photosensitivity and excellent hole masking performance 浙江福斯特新材料研究院有限公司 2018-06-26 — — CN disclosed
Send feedback