SCHEMBL282295

SCHEMBL282295

O=C(OI)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27599816 0.97
Benzene SCHEMBL28335997 0.91 CES1 (0.37)
SCHEMBL21339899 0.75
SCHEMBL7516120 0.75
SCHEMBL27623481 0.72 CA2 (0.35)
SCHEMBL52 0.72 CA2 (0.35)
SCHEMBL3500822 0.72 CA2 (0.35)
SCHEMBL24625927 0.71
SCHEMBL23591848 0.69 ALDH1A1 (0.33)
SCHEMBL3945657 0.69 CA2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109705124-A A kind of labeled with radioactive fluorine Larotrectinib compound and preparation method thereof 上海健康医学院 2019-05-03 CN claimed
CN-122070309-A Composition, resin composition, film-forming composition for lithography, and resist film-forming composition 三菱瓦斯化学株式会社 2026-05-19 CN disclosed
US-20250250216-A1 CYCLIC COMPOUND HAVING IODINE ATOM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-08-07 US disclosed
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
EP-4565323-A1 AROMATIC COMPOUNDS FOR USE AS PROTEIN PHOSPHATASE 2A (PP2A) MODULATORS Rappta Therapeutics Oy (FI) 2025-06-11 EP disclosed
CN-114269739-B 1,3, 4-Diazole derivatives as histone deacetylase inhibitors 奎马特里克斯公司 2025-04-22 CN disclosed
WO-2025079631-A1 COMPOSITION, RESIN COMPOSITION, COMPOSITION FOR FILM FORMATION, COMPOSITION FOR FORMING LITHOGRAPHIC FILM, AND COMPOSITION FOR FORMING RESIST FILM 三菱瓦斯化学株式会社 2025-04-17 WO disclosed
WO-2025033019-A1 COMPOUND, COMPOSITION, METHOD FOR EXPRESSING SENSITIZING EFFECT, AND PRODUCTION METHOD 三菱瓦斯化学株式会社 2025-02-13 WO disclosed
US-12202823-B2 1,3,4-oxadiazole derivatives as histone deacetylase inhibitors QUIMATRYX, S.L. (ES) 2025-01-21 US disclosed
CN-1135333-A Usage of SRCSH2 specific compound for treatment of bone absorption disease SMITHKLINE BEECHAM CORP (US) 1996-11-13 CN disclosed
EP-0728482-A2 Use of hcp specific compounds to enhance erythropoiesis SMITHKLINE BEECHAM CORPORATION (US) 1996-08-28 EP disclosed
EP-0727211-A1 Use of src SH2 specific compounds to treat a bone resorption disease SMITHKLINE BEECHAM CORPORATION (US) 1996-08-21 EP disclosed
WO-1996024343-A1 USE OF LCK SH2 SPECIFIC COMPOUNDS TO TREAT AUTOIMMUNE DISEASES AND ALLOGRAFT REJECTION SMITHKLINE BEECHAM CORPORATION (US) 1996-08-15 WO disclosed
US-5061798-A Intermediates in the formation of synthetic hormones, mimic effects of thyroid hormones; little or no effect on the heart SMITH KLINE & FRENCH LABORATORIES, LTD. (GB) 1991-10-29 US disclosed
EP-0188351-B1 CHEMICAL COMPOUNDS SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1991-03-13 EP disclosed
US-4910305-A Containing a protected 4-hydroxyphenyl SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1990-03-20 US disclosed
US-4826876-A WITHOUT EFFECT ON HEART SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1989-05-02 US disclosed
US-4766121-A NOT AFFECTING THE HEART SMITH KLINE & FRENCH LABORATORIES LTD. (GB) 1988-08-23 US disclosed
EP-0188351-A2 Chemical compounds SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1986-07-23 EP disclosed