Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GNAI3 | P08754 | 2/20 | 0.66 |
| ▸ | GNAO1 | P09471 | 2/20 | 0.66 |
| ▸ | GNAI1 | P63096 | 2/20 | 0.66 |
| ▸ | S1PR4 | O95977 | 2/20 | 0.60 |
| ▸ | S1PR1 | P21453 | 2/20 | 0.60 |
| ▸ | S1PR3 | Q99500 | 2/20 | 0.60 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.60 |
| ▸ | EPHX1 | P07099 | 11/20 | 0.55 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.49 |
| ▸ | GBA1 | P04062 | 5/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28207776 | 1.00 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL21367529 | 1.00 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL1433258 | 0.98 | GNAI3 (0.62) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL9801904 | 0.95 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL1485554 | 0.95 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL9801333 | 0.95 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL9801513 | 0.95 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL9801263 | 0.95 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL9801953 | 0.95 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 | |
| SCHEMBL9801024 | 0.95 | GNAI3 (0.66) | GNAI3GNAO1GNAI1S1PR4S1PR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108602955-B | Photocuring method, compound used in photocuring method, and composition | 富士胶片和光纯药株式会社 | 2021-08-06 | — | — | CN | disclosed |
| CN-107848963-B | Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same | 富士胶片和光纯药株式会社 | 2020-11-03 | — | — | CN | disclosed |
| CN-110678500-A | Photo-or thermosetting method and curable resin composition | 富士胶片和光纯药株式会社 | 2020-01-10 | — | — | CN | disclosed |
| CN-108602955-A | The compound and composition used in process for photocuring, the process for photocuring | 富士胶片和光纯药株式会社 | 2018-09-28 | — | — | CN | disclosed |