SCHEMBL28248490

SCHEMBL28248490

NCc1cc(O)c(C2CCCCC2)cc1C(c1cccc(O)c1)c1cc(C2CCCCC2)c(O)cc1CN

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ NUDT1 P36639 1/20 0.40
▸ BACE1 P56817 1/20 0.40
▸ SLC6A4 P31645 1/20 0.36
▸ OPRM1 P35372 1/20 0.36
▸ KDR P35968 1/20 0.36
▸ SLC6A3 Q01959 1/20 0.36
▸ OPRD1 P41143 1/20 0.34
▸ OPRK1 P41145 1/20 0.34
▸ HSP90AA1 P07900 1/20 0.33
▸ TYR P14679 1/20 0.32
▸ SIGMAR1 Q99720 3/20 0.32
▸ DRD4 P21917 2/20 0.32
▸ DRD3 P35462 2/20 0.32
▸ NFKB1 P19838 1/20 0.32
▸ PRCP P42785 1/20 0.32
▸ EBP Q15125 1/20 0.32
▸ DRD2 P14416 1/20 0.32
▸ ENPP2 Q13822 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28269345 0.86 NUDT1 (0.43) NUDT1BACE1HSP90AA1NFKB1
SCHEMBL30103811 0.85 SLC6A4 (0.40) NUDT1BACE1SLC6A4OPRM1KDR
SCHEMBL28899040 0.85 SLC6A4 (0.40) NUDT1BACE1SLC6A4OPRM1KDR
SCHEMBL28278535 0.81 NUDT1 (0.43) NUDT1BACE1OPRM1OPRD1OPRK1
SCHEMBL30374841 0.81 SLC6A4 (0.40) NUDT1BACE1SLC6A4OPRM1KDR
SCHEMBL757144 0.81 SLC6A4 (0.40) NUDT1BACE1SLC6A4OPRM1KDR
SCHEMBL29373431 0.81 SLC6A4 (0.40) NUDT1BACE1SLC6A4OPRM1KDR
SCHEMBL29376176 0.77 NUDT1 (0.44) NUDT1BACE1SLC6A4OPRM1KDR
SCHEMBL761321 0.77 NUDT1 (0.44) NUDT1BACE1SLC6A4OPRM1KDR
SCHEMBL30899189 0.77 NUDT1 (0.44) NUDT1BACE1SLC6A4OPRM1KDR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105425545-B Positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2019-11-08 — — CN disclosed
CN-105093832-B Photosensitive composition, protective film and element having protective film 奇美实业股份有限公司 2019-08-30 — — CN disclosed
CN-104423170-B Photosensitive polysiloxane composition, protective film and assembly with protective film 奇美实业股份有限公司 2019-05-24 — — CN disclosed
CN-104345567-B photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2019-04-02 — — CN disclosed
CN-104698756-B Positive photosensitive resin composition, pattern forming method, thin film transistor array substrate and liquid crystal display device 奇美实业股份有限公司 2019-03-22 — — CN disclosed
CN-109426073-A Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2019-03-05 — — CN disclosed
CN-109062007-A positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2018-12-21 — — CN disclosed
CN-104423168-B Positive photosensitive resin composition and pattern forming method thereof 奇美实业股份有限公司 2018-11-30 — — CN disclosed
CN-108693710-A Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2018-10-23 — — CN disclosed
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