Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 1/20 | 0.40 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.40 |
| ▸ | KDR | P35968 | 1/20 | 0.40 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.40 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.36 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.36 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.35 |
| ▸ | BACE1 | P56817 | 1/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.34 |
| ▸ | DRD4 | P21917 | 2/20 | 0.34 |
| ▸ | DRD3 | P35462 | 2/20 | 0.34 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.34 |
| ▸ | PRCP | P42785 | 1/20 | 0.34 |
| ▸ | EBP | Q15125 | 1/20 | 0.34 |
| ▸ | DRD2 | P14416 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30374841 | 1.00 | SLC6A4 (0.40) | SLC6A4OPRM1KDRSLC6A3OPRD1 | |
| SCHEMBL29373431 | 1.00 | SLC6A4 (0.40) | SLC6A4OPRM1KDRSLC6A3OPRD1 | |
| SCHEMBL30103811 | 0.88 | SLC6A4 (0.40) | SLC6A4OPRM1KDRSLC6A3OPRD1 | |
| SCHEMBL278752 | 0.88 | NUDT1 (0.37) | OPRM1OPRD1OPRK1NUDT1BACE1 | |
| SCHEMBL28899040 | 0.88 | SLC6A4 (0.40) | SLC6A4OPRM1KDRSLC6A3OPRD1 | |
| SCHEMBL29499852 | 0.85 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1 | |
| SCHEMBL36658 | 0.85 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1 | |
| SCHEMBL29372915 | 0.85 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1 | |
| SCHEMBL17222748 | 0.85 | SLC6A4 (0.31) | SLC6A4OPRM1KDRSLC6A3 | |
| SCHEMBL36430 | 0.84 | HIF1A (0.39) | NUDT1BACE1HSP90AA1ALDH1A1DRD4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 349 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | claimed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-114902135-B | Positive photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117321109-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-111205648-B | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117106358-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| US-5702861-A | BLEND OF ALKALI SOLUBLE RESIN, QUINONE DIAZIDE COMPOUND AND AN AROMATIC POLYHYDROXY COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| US-5702862-A | ALKALI SOLUBLE RESIN; A QUINONE DIAZIDE GROUP-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| US-5677102-A | DISSOLVING AN ALKALI SOLUBLE RESIN AND A QUINONEDIAZIDE GROUP CONTAINING COMPOUND; HEATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-10-14 | — | — | US | disclosed |
| US-5604077-A | MIXTURE OF ALKALI-SOLUBLE NOVOLAK AND A QUINONE DIAZIDE PHOTOSENSITIZER; HEAT RESISTANCE, RESOLUTION, ANTIFOULING AGENTS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-18 | — | — | US | disclosed |
| US-5601961-A | QUINONE DIAZIDE GROUP-CONTAINING COMPOUND AS PHOTOSENSITIZING AGENT, ALKALI-SOLUBLE RESINOUS INGREDIENT AS FILM-FORMING AGENT MADE FROM A BLEND OF AT LEAST TWO NOVOLAK-TYPE RESINS FROM M-AND P-CRESOL, A XYLENOL AND A TRIMETHYLPHENOL | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-11 | — | — | US | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | disclosed |
| US-5401605-A | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-03-28 | — | — | US | disclosed |