Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.58 |
| ▸ | CASP1 | P29466 | 1/20 | 0.58 |
| ▸ | RECQL | P46063 | 1/20 | 0.58 |
| ▸ | MAOA | P21397 | 4/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | CA12 | O43570 | 2/20 | 0.46 |
| ▸ | CA1 | P00915 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | CA9 | Q16790 | 2/20 | 0.46 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.46 |
| ▸ | CA7 | P43166 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | MAOB | P27338 | 4/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL21624958 | 1.00 | CYP3A4 (0.58) | CYP3A4CASP1RECQLMAOAALDH1A1 | |
| SCHEMBL31099299 | 0.97 | — | — | |
| SCHEMBL61220 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL28657534 | 0.94 | — | — | |
| SCHEMBL2960481 | 0.94 | — | — | |
| Methane SCHEMBL1639492 | 0.94 | — | — | |
| SCHEMBL27270310 | 0.94 | — | — | |
| Phenol SCHEMBL27588321 | 0.87 | ALDH1A1 (0.58) | CYP3A4CASP1RECQLMAOAALDH1A1 | |
| Benzenethiol SCHEMBL27818160 | 0.86 | CYP3A4 (0.63) | CYP3A4CASP1RECQLMAOAALDH1A1 | |
| SCHEMBL25975098 | 0.82 | MAOA (0.62) | CYP3A4CASP1RECQLMAOAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110475859-A | The method for inhibiting neural stem cell differentiating method, the method for preparation neural stem cell and induced nerve stem cells to break up | UBE INDUSTRIES | 2019-11-19 | — | — | CN | disclosed |
| CN-110099974-A | Composition is used in the formation of substrate protective layer | 日产化学株式会社 | 2019-08-06 | — | — | CN | disclosed |
| CN-110050013-A | The manufacturing method of peeling layer | 日产化学株式会社 | 2019-07-23 | — | — | CN | disclosed |
| CN-109563341-A | Peeling layer formation composition for transparent resin substrate | 日产化学株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-109563300-A | Method for producing porous polyimide film and porous polyimide film produced by the method | 宇部兴产株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-109562201-A | For treating the implantation material of bone injury site and the treatment method of kit and bone injury site | 宇部兴产株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-109563465-A | Cell culture apparatus and the cell culture processes for using the cell culture apparatus | 宇部兴产株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-109496231-A | Cell culture apparatus and the cell culture processes for using it | 宇部兴产株式会社 | 2019-03-19 | — | — | CN | disclosed |
| CN-109476912-A | Composition for forming release layer | 日产化学株式会社 | 2019-03-15 | — | — | CN | disclosed |
| CN-109477056-A | Siphon cultivation method | 宇部兴产株式会社 | 2019-03-15 | — | — | CN | disclosed |
| CN-109477055-A | Preparation method, cell culture apparatus and the kit of cell | 宇部兴产株式会社 | 2019-03-15 | — | — | CN | disclosed |
| CN-106133062-B | Composition is used in peeling layer formation | 日产化学工业株式会社 | 2019-02-19 | — | — | CN | disclosed |
| CN-109196051-A | Peeling layer, which is formed, uses composition and peeling layer | 日产化学株式会社 | 2019-01-11 | — | — | CN | disclosed |
| CN-109153851-A | Peeling layer, which is formed, uses composition and peeling layer | 日产化学株式会社 | 2019-01-04 | — | — | CN | disclosed |
| CN-109153852-A | Peeling layer, which is formed, uses composition and peeling layer | 日产化学株式会社 | 2019-01-04 | — | — | CN | disclosed |