SCHEMBL28295001

SCHEMBL28295001

Nc1c(-c2ccccc2)c(-c2ccccc2)cc2ccc(-c3ccccc3)cc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.44
ESR2 Q92731 3/20 0.44
BACE1 P56817 1/20 0.41
GPR84 Q9NQS5 3/20 0.41
JAK2 O60674 2/20 0.40
CYP3A4 P08684 2/20 0.40
HSD17B1 P14061 2/20 0.40
HSD17B2 P37059 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2D6 P10635 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2B6 P20813 1/20 0.40
CYP2C19 P33261 1/20 0.40
DHFR P00374 1/20 0.39
MAP4K4 O95819 1/20 0.39
MAOA P21397 1/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
KDM4E B2RXH2 3/20 0.38
MAPT P10636 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30902294 0.84 MEN1 (0.47) ESR1ESR2GPR84MEN1KMT2A
SCHEMBL272956 0.84 MEN1 (0.47) ESR1ESR2GPR84MEN1KMT2A
Water SCHEMBL10783729 0.82 KMT2A (0.46) ESR1ESR2GPR84MEN1KMT2A
Ammonia Solution, Strong SCHEMBL29267919 0.82 MEN1 (0.46) ESR1ESR2GPR84MEN1KMT2A
SCHEMBL1274371 0.81 ESR1 (0.42) ESR1ESR2GPR84CYP3A4MEN1
SCHEMBL21461867 0.80 BACE1 (0.44) ESR1ESR2BACE1JAK2CYP3A4
SCHEMBL7652128 0.75 MEN1 (0.51) GPR84CYP1A2MEN1KMT2AKDM4E
SCHEMBL1274355 0.75 HPRT1 (0.49) ESR1ESR2CYP1A2CYP2D6CYP2C9
SCHEMBL1456297 0.75 GRM2 (0.41) GPR84CYP3A4CYP1A2CYP2C19MEN1
SCHEMBL29803814 0.73 CYP1A1 (0.45) ESR1ESR2BACE1HSD17B1HSD17B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109790457-A Aromatic amine derivant and its preparation method and application 广州华睿光电材料有限公司 2019-05-21 CN disclosed