SCHEMBL2829656

SCHEMBL2829656

CCO/C(C)=C(\C)C(N)=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.52
ALDH1A1 P00352 6/20 0.48
LMNA P02545 2/20 0.48
HSD17B10 Q99714 1/20 0.48
GAA P10253 3/20 0.40
MGAM O43451 1/20 0.40
SI P14410 1/20 0.40
MGAM2 Q2M2H8 1/20 0.40
SOAT1 P35610 1/20 0.40
CAD P27708 1/20 0.37
TRPA1 O75762 1/20 0.37
CYP1A2 P05177 2/20 0.37
GLO1 Q04760 1/20 0.37
TSHR P16473 2/20 0.34
HPGD P15428 2/20 0.34
MAPT P10636 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
NOS3 P29474 1/20 0.33
NOS2 P35228 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28541016 1.00 ALOX15 (0.52) ALOX15ALDH1A1LMNAHSD17B10GAA
SCHEMBL5070827 0.81 ALDH1A1 (0.38) ALOX15ALDH1A1LMNAHSD17B10TSHR
SCHEMBL7697460 0.81 ALDH1A1 (0.38) ALOX15ALDH1A1LMNAHSD17B10TSHR
SCHEMBL11463924 0.80 ALOX15 (0.52) ALOX15ALDH1A1LMNAHSD17B10GAA
SCHEMBL28337966 0.80 ALOX15 (0.52) ALOX15ALDH1A1LMNAHSD17B10GAA
SCHEMBL28214328 0.80 ALOX15 (0.35) ALOX15ALDH1A1LMNAHSD17B10TDP1
SCHEMBL11463923 0.80 ALOX15 (0.52) ALOX15ALDH1A1LMNAHSD17B10GAA
SCHEMBL19678255 0.79 ALDH1A1 (0.52) ALOX15ALDH1A1LMNAHSD17B10GAA
SCHEMBL454526 0.78 ALDH1A1 (0.56) ALDH1A1LMNAHSD17B10CYP1A2TSHR
SCHEMBL7762738 0.78 ALDH1A1 (0.56) ALDH1A1LMNAHSD17B10CYP1A2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114384759-A Florenol acrylate for black matrix photoresist, preparation method thereof, resin composition and application method 江苏博砚电子科技有限公司 2022-04-22 CN claimed
CN-114380937-A Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof 江苏博砚电子科技有限公司 2022-04-22 CN claimed
CN-114384759-A Florenol acrylate for black matrix photoresist, preparation method thereof, resin composition and application method 江苏博砚电子科技有限公司 2022-04-22 CN disclosed
CN-110256630-A Phase difference material is formed with resin combination, orientation material and phase difference material 日产化学工业株式会社 2019-09-20 CN disclosed
CN-105637418-B Negative working lithographic plate precursor 伊斯曼柯达公司 2019-08-23 CN disclosed
CN-106030355-B Resin composition for forming phase difference material, alignment material, and phase difference material 日产化学工业株式会社 2019-06-18 CN disclosed
CN-109196069-A The manufacturing method of adhesion agent composition and adhesion agent composition 昭和电工株式会社 2019-01-11 CN disclosed
CN-106233424-B Silicon Wafer composition for polishing 福吉米株式会社 2018-12-25 CN disclosed
EP-2217827-A2 SUSPENSION SYSTEM FOR AIRCRAFT AUXILIARY POWER UNIT WITH ELASTOMERIC MEMBER Lord Corporation (US) 2010-08-18 EP disclosed
EP-2178961-A1 PROCESS FOR MAKING POLYOLEFIN CLAY NANOCOMPOSITES Nova Chemicals Inc. (US) 2010-04-28 EP disclosed
WO-2009054926-A2 SUSPENSION SYSTEM FOR AIRCRAFT AUXILIARY POWER UNIT WITH ELASTOMERIC MEMBER LORD CORPORATION (US) 2009-04-30 WO disclosed
EP-0755803-B1 LITHOGRAPHIC FORM PLATE TORAY INDUSTRIES (JP) 2001-07-25 EP disclosed
US-6093509-A NON-IMAGE AREA COMPRISE A HYDROPHILIC SWELLABLE LAYER WITH SPEACIFIC WATER ABSORBABILITY, MODULUS AND WATER SWELLING RATIO TORAY INDUSTRIES, INC. (JP) 2000-07-25 US disclosed
EP-0755803-A1 LITHOGRAPHIC FORM PLATE TORAY INDUSTRIES, INC. (JP) 1997-01-29 EP disclosed
US-5290634-A Multilayer elements with supports coated with antistatic layer and gelatin MITSUBISHI PAPER MILLS LIMITED (JP) 1994-03-01 US disclosed
EP-0156208-B1 AQUEOUS DISPERSIONS FOR THE MANUFACTURE OF CROSS-LINKABLE COATINGS HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-17 EP disclosed
US-5008155-A Bake-coating a dispersion at a temperature below minimum film-forming; then, bake-crosslinking at a temperature higher than its glass transition one; noncracking polyacrylates HOECHST AKTIENGESELLSCHAFT (DE) 1991-04-16 US disclosed
EP-0155589-B1 PROCESS FOR PRODUCING COATINGS ON SURFACES OF SOLID MATERIALS BY BAKING HOECHST AKTIENGESELLSCHAFT (DE) 1989-07-26 EP disclosed
US-4610898-A Process for bake coating the surfaces of solid substances HOECHST AKTIENGESELLSCHAFT (DE) 1986-09-09 US disclosed
EP-0156208-A2 Aqueous dispersions for the manufacture of cross-linkable coatings HOECHST AKTIENGESELLSCHAFT (DE) 1985-10-02 EP disclosed