SCHEMBL28299040

SCHEMBL28299040

C=C(C(=O)OC)c1ccccc1.C=C(C)C(=O)OCC(C)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.45
ADRB2 P07550 2/20 0.41
ADRB1 P08588 2/20 0.41
ADRB3 P13945 2/20 0.41
ELANE P08246 1/20 0.40
KMT2A Q03164 1/20 0.39
TDP1 Q9NUW8 3/20 0.39
ATM Q13315 2/20 0.39
ALDH1A1 P00352 4/20 0.39
MAPT P10636 3/20 0.38
ESRRB O95718 1/20 0.38
LMNA P02545 3/20 0.37
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
XBP1 P17861 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
PTGS1 P23219 1/20 0.35
PTGS2 P35354 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28092988 0.87 ALDH1A1 (0.46) TSHRADRB2ADRB1ADRB3ELANE
SCHEMBL28270826 0.83 TSHR (0.44) TSHRADRB2ADRB1ADRB3ALDH1A1
SCHEMBL11465517 0.81 TSHR (0.47) TSHRADRB2ADRB1ADRB3ELANE
Diphenylether SCHEMBL8065401 0.80 TSHR (0.50) TSHRELANETDP1ALDH1A1LMNA
Styrene SCHEMBL5246216 0.79 TSHR (0.49) TSHRADRB2ADRB1ADRB3ELANE
Diphenylsulfane SCHEMBL8053800 0.79 TSHR (0.49) TSHRELANETDP1ALDH1A1MAPT
SCHEMBL829508 0.79 TSHR (0.56) TSHRELANEKMT2ATDP1ATM
SCHEMBL8069892 0.78 TSHR (0.47) TSHRKMT2AALDH1A1LMNAHTT
Hydroxyamine SCHEMBL28449118 0.77 TDP1 (0.50) TSHRELANEKMT2ATDP1ATM
Hydrochloric Acid SCHEMBL19749005 0.77 TSHR (0.54) TSHRELANEKMT2ATDP1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110471257-A The manufacturing method of photosensitive polymer combination, photosensitive dry film and its manufacturing method, resist film, substrate and plating forming object TOKYO OHKA KOGYO COMPANY 2019-11-19 CN disclosed
CN-110317174-A Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component 东京应化工业株式会社 2019-10-11 CN disclosed
CN-109709770-A The manufacturing method of resin combination, dry film and manufacturing method, resist film and substrate and plating forming object, sulfhydryl compound 东京应化工业株式会社 2019-05-03 CN disclosed
CN-107703658-A The manufacture method of substrate 东京应化工业株式会社 2018-02-16 CN disclosed
CN-107272343-A Chemical amplification type positive photosensitive polymer combination 东京应化工业株式会社 2017-10-20 CN disclosed