Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | ADRA1B | P35368 | 3/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | BRD4 | O60885 | 1/20 | 0.39 |
| ▸ | BRD2 | P25440 | 1/20 | 0.39 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19514128 | 0.91 | KMT2A (0.50) | KMT2AMEN1PIK3CDPOLBADRA1B | |
| SCHEMBL823276 | 0.89 | PIK3CD (0.50) | KMT2AMEN1PIK3CDPOLBPKM | |
| SCHEMBL7937319 | 0.89 | KMT2A (0.51) | KMT2AMEN1PIK3CDPOLBADRA1B | |
| SCHEMBL20687601 | 0.87 | KMT2A (0.48) | KMT2AMEN1PIK3CDPOLBPKM | |
| SCHEMBL19514136 | 0.86 | PIK3CD (0.44) | KMT2APIK3CDTSHR | |
| SCHEMBL2230148 | 0.86 | PIK3CD (0.44) | KMT2APIK3CDTSHR | |
| SCHEMBL20687600 | 0.86 | KMT2A (0.47) | KMT2AMEN1PIK3CDPOLBPKM | |
| SCHEMBL20687603 | 0.85 | KMT2A (0.45) | KMT2AMEN1PIK3CDPOLBPKM | |
| SCHEMBL8560901 | 0.85 | KMT2A (0.49) | KMT2AMEN1PIK3CDPOLBPKM | |
| SCHEMBL20579542 | 0.84 | L3MBTL1 (0.47) | KMT2AMEN1PIK3CDPOLBADRA1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110198995-A | Composition for forming self-assembled film for forming fine phase separation pattern | 日产化学株式会社 | 2019-09-03 | — | — | CN | disclosed |