Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.45 |
| ▸ | MEN1 | O00255 | 4/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | ATM | Q13315 | 2/20 | 0.45 |
| ▸ | CRHBP | P24387 | 2/20 | 0.45 |
| ▸ | CRHR2 | Q13324 | 2/20 | 0.45 |
| ▸ | TLR9 | Q9NR96 | 2/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.37 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.37 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.37 |
| ▸ | CCR6 | P51684 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3192734 | 0.98 | ALDH1A1 (0.47) | ALDH1A1MEN1KMT2AATMCRHBP | |
| SCHEMBL10629687 | 0.95 | ALDH1A1 (0.45) | ALDH1A1MEN1KMT2AATMCRHBP | |
| SCHEMBL28360989 | 0.95 | ALDH1A1 (0.45) | ALDH1A1MEN1KMT2AATMCRHBP | |
| SCHEMBL1467700 | 0.95 | ALDH1A1 (0.45) | ALDH1A1MEN1KMT2AATMCRHBP | |
| SCHEMBL1467698 | 0.95 | ALDH1A1 (0.45) | ALDH1A1MEN1KMT2AATMCRHBP | |
| SCHEMBL1467699 | 0.95 | ALDH1A1 (0.45) | ALDH1A1MEN1KMT2AATMCRHBP | |
| Benzoquinone SCHEMBL29042543 | 0.86 | ALDH1A1 (0.39) | ALDH1A1MEN1KMT2AATMCRHBP | |
| Ammonia Solution, Strong SCHEMBL28083136 | 0.76 | ALDH1A1 (0.48) | ALDH1A1MEN1KMT2AATMCRHBP | |
| SCHEMBL11834995 | 0.76 | ACHE (0.46) | ALDH1A1LMNACYP3A4HSD17B10TDP1 | |
| SCHEMBL17935 | 0.73 | ALDH1A1 (0.50) | ALDH1A1MEN1KMT2AATMCRHBP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117976547-B | Method for reducing etching side erosion of copper-clad ceramic substrate solder | 江苏富乐华功率半导体研究院有限公司 | 2024-08-13 | — | — | CN | claimed |
| CN-117976547-A | Method for reducing etching side erosion of copper-clad ceramic substrate solder | 江苏富乐华功率半导体研究院有限公司 | 2024-05-03 | — | — | CN | claimed |
| JP-4188118-A | — | — | None | — | — | JP | disclosed |
| JP-62021711-A | — | — | None | — | — | JP | disclosed |
| CN-117976547-B | Method for reducing etching side erosion of copper-clad ceramic substrate solder | 江苏富乐华功率半导体研究院有限公司 | 2024-08-13 | — | — | CN | disclosed |
| CN-117976547-A | Method for reducing etching side erosion of copper-clad ceramic substrate solder | 江苏富乐华功率半导体研究院有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-114763393-B | Cation exchanger, method for producing same, use thereof and polymer | 朗盛德国有限责任公司 | 2024-03-08 | — | — | CN | disclosed |
| CN-107922555-A | Curing composition | 东亚合成株式会社 | 2018-04-17 | — | — | CN | disclosed |
| CN-107850844-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2018-03-27 | — | — | CN | disclosed |
| CN-107709377-A | Curing composition | 东亚合成株式会社 | 2018-02-16 | — | — | CN | disclosed |
| CN-107709376-A | Curing composition | 东亚合成株式会社 | 2018-02-16 | — | — | CN | disclosed |
| CN-103492948-B | Photosensitive compound and photosensitive resin composition comprising same | 株式会社LG化学 | 2016-06-08 | — | — | CN | disclosed |
| US-7741005-B2 | A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation | FUJIFILM CORPORATION (JP) | 2010-06-22 | — | — | US | disclosed |
| EP-1839853-B1 | Planographic printing plate precursor and stack thereof | FUJIFILM CORP (JP) | 2009-07-08 | — | — | EP | disclosed |
| US-20070231740-A1 | A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation | FUJIFILM CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| EP-1839853-A1 | Planographic printing plate precursor and stack thereof | FUJIFILM Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |
| JP-H04188118-A | NONLINEAR OPTICAL MATERIAL | MATSUSHITA ELECTRIC IND CO LTD | 1992-07-06 | — | — | JP | disclosed |
| JP-S6221711-A | SELECTIVE SEPARATION AND RECOVERY OF GALLIUM | UBE IND LTD | 1987-01-30 | — | — | JP | disclosed |