SCHEMBL28326311

SCHEMBL28326311

Clc1cccc2c(-c3ccccc3)c3ccccc3cc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.52
CYP2A6 P11509 4/20 0.52
ESR1 P03372 7/20 0.51
ESR2 Q92731 6/20 0.51
ALOX5 P09917 2/20 0.41
ALDH1A1 P00352 2/20 0.39
HIF1A Q16665 1/20 0.39
CYP1B1 Q16678 1/20 0.39
HSD17B10 Q99714 1/20 0.39
MAP2 P11137 1/20 0.39
KDM4E B2RXH2 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
GPR84 Q9NQS5 2/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
HSD17B1 P14061 1/20 0.38
CYP2B6 P20813 1/20 0.38
CYP2C19 P33261 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22512513 0.88 CYP2A6 (0.50) CYP1A2CYP2A6ESR1ESR2MAP2
SCHEMBL7918675 0.86 CYP1A2 (0.48) CYP1A2CYP2A6ESR1ESR2ALDH1A1
SCHEMBL30337996 0.82 ESR1 (0.59) CYP1A2ESR1ESR2ALOX5ALDH1A1
SCHEMBL10864353 0.82 ESR1 (0.59) CYP1A2ESR1ESR2ALOX5ALDH1A1
SCHEMBL27287007 0.80 CYP1A2 (0.45) CYP1A2CYP2A6ESR1ESR2ALOX5
SCHEMBL1527283 0.80 ALOX5 (0.53) CYP1A2ESR1ESR2ALOX5ALDH1A1
SCHEMBL300507 0.80 ALOX5 (0.57) CYP1A2ESR1ESR2ALOX5ALDH1A1
SCHEMBL29362847 0.80 ALOX5 (0.57) CYP1A2ESR1ESR2ALOX5ALDH1A1
SCHEMBL2967574 0.79 CYP2A6 (0.44) CYP1A2CYP2A6ESR1ESR2ALDH1A1
SCHEMBL5955641 0.79 ESR1 (0.49) ESR1ESR2ALOX5ALDH1A1HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
CN-110446976-A Photosensitive resin composition ASAHI CHEMICAL IND 2019-11-12 CN disclosed