Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL28328604

CCSc1ccccc1.S

nearest known ligand 0.57

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.57
MAPK1 P28482 1/20 0.57
MAOA P21397 2/20 0.48
MAOB P27338 1/20 0.48
FFAR1 O14842 1/20 0.46
SLC6A4 P31645 6/20 0.43
MAPT P10636 1/20 0.43
HPGD P15428 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
MGLL Q99685 1/20 0.43
HSD17B10 Q99714 1/20 0.43
MTNR1A P48039 2/20 0.41
MTNR1B P49286 2/20 0.41
TP53 P04637 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
HIF1A Q16665 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL95992 0.97
SCHEMBL7529643 0.97
Fluoride SCHEMBL945714 0.94 ALDH1A1 (0.57) ALDH1A1MAPK1MAOAMAOBFFAR1
Ethylene SCHEMBL28310274 0.92 ALDH1A1 (0.55) ALDH1A1MAPK1MAOAMAOBFFAR1
Dimethylamine SCHEMBL5176483 0.90 ALDH1A1 (0.59) ALDH1A1MAPK1MAOAMAOBFFAR1
Methylphenylsulfide SCHEMBL29061319 0.87 ALDH1A1 (0.50) ALDH1A1MAPK1MAOAMAOBFFAR1
SCHEMBL6594385 0.87 ALDH1A1 (0.50) ALDH1A1MAPK1MAOAMAOBFFAR1
SCHEMBL10873673 0.87 ALDH1A1 (0.50) ALDH1A1MAPK1MAOAMAOBFFAR1
Hydroquinone SCHEMBL27639375 0.85 ALDH1A1 (0.48) ALDH1A1MAPK1MAOAMAOBFFAR1
Formic Acid SCHEMBL27454596 0.84 FFAR1 (0.48) ALDH1A1MAPK1MAOAMAOBFFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110471257-A The manufacturing method of photosensitive polymer combination, photosensitive dry film and its manufacturing method, resist film, substrate and plating forming object TOKYO OHKA KOGYO COMPANY 2019-11-19 CN disclosed