⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27414160 | 0.78 | ALDH1A1 (0.37) | — | |
| SCHEMBL1953048 | 0.77 | — | — | |
| SCHEMBL27631045 | 0.77 | — | — | |
| SCHEMBL27786176 | 0.77 | — | — | |
| SCHEMBL8310516 | 0.77 | TSHR (0.37) | — | |
| Hydrochloric Acid SCHEMBL27972066 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL28127597 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL27984612 | 0.75 | — | — | |
| SCHEMBL8313764 | 0.74 | ALDH1A1 (0.32) | — | |
| SCHEMBL4717467 | 0.74 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104932210-B | Photoresist stripping composition and stripping means, plate, flat-panel monitor and its preparation method | TONGWOO FINE CHEMICALS CO., LTD. (KR) | 2019-11-01 | — | — | CN | disclosed |