⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL79834 | 0.70 | — | — | |
| SCHEMBL10012673 | 0.67 | — | — | |
| SCHEMBL8050431 | 0.67 | — | — | |
| SCHEMBL6263467 | 0.64 | — | — | |
| SCHEMBL140789 | 0.64 | — | — | |
| SCHEMBL949352 | 0.64 | — | — | |
| Water SCHEMBL3022355 | 0.64 | — | — | |
| Tert-Butanol SCHEMBL282 | 0.61 | — | — | |
| SCHEMBL39492 | 0.61 | — | — | |
| Tert-Butanol SCHEMBL20503401 | 0.61 | ALDH1A1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115943348-A | Resist underlayer film forming composition using diarylmethane derivative | 日产化学株式会社 | 2023-04-07 | — | — | CN | disclosed |
| CN-115427891-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-12-02 | — | — | CN | disclosed |
| CN-115136074-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-114830298-A | Composition for forming resist underlayer film for nanoimprinting | 日产化学株式会社 | 2022-07-29 | — | — | CN | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114746468-A | Method for producing polymer | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-114503032-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-114424121-A | Composition for forming resist underlayer film containing heterocyclic compound | 日产化学株式会社 | 2022-04-29 | — | — | CN | disclosed |
| CN-114174926-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| CN-113994261-A | Wet-etchable resist underlayer film forming composition containing heterocyclic compound having dicyanostyryl group | 日产化学株式会社 | 2022-01-28 | — | — | CN | disclosed |
| CN-113316595-A | Composition for forming protective film having acetal structure and amide structure | 日产化学株式会社 | 2021-08-27 | — | — | CN | disclosed |
| CN-112969739-A | Composition for forming chemical liquid resistant protective film containing polymer product with glycidyl group-containing arylene compound | 日产化学株式会社 | 2021-06-15 | — | — | CN | disclosed |
| CN-112437901-A | Resist underlayer film forming composition containing hetero atom in polymer main chain | 日产化学株式会社 | 2021-03-02 | — | — | CN | disclosed |
| CN-112313226-A | Resist underlayer film forming composition containing reaction product with glycidyl ester compound | 日产化学株式会社 | 2021-02-02 | — | — | CN | disclosed |
| CN-112236720-A | Composition for forming resist underlayer film using carbon-oxygen double bond | 日产化学株式会社 | 2021-01-15 | — | — | CN | disclosed |
| CN-112166379-A | Resist underlayer film forming composition using cyclic carbonyl compound | 日产化学株式会社 | 2021-01-01 | — | — | CN | disclosed |
| CN-111670410-A | Composition for forming resist underlayer film having disulfide structure | 日产化学株式会社 | 2020-09-15 | — | — | CN | disclosed |
| CN-111492312-A | Composition for forming protective film having diol structure | 日产化学株式会社 | 2020-08-04 | — | — | CN | disclosed |
| CN-111108441-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2020-05-05 | — | — | CN | disclosed |
| CN-110546570-A | composition for forming resist underlayer film using fluorene compound | NISSAN CHEMICAL CORP | 2019-12-06 | — | — | CN | disclosed |