SCHEMBL28335

SCHEMBL28335

CNS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL9736295 0.96
Ammonia Solution, Strong SCHEMBL4593032 0.96
SCHEMBL27739687 0.96
SCHEMBL28009988 0.96
Fluoride SCHEMBL11220083 0.96
SCHEMBL28864996 0.96
SCHEMBL27826196 0.96
Sulfuric Acid SCHEMBL439830 0.76
Sulfuric Acid SCHEMBL166895 0.76 CA5A (0.60)
Dimethylamine SCHEMBL4531539 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1562 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4735391-A2 ALKYL SULFONIC ACID COMPOSITIONS USEFUL IN DESCALING APPLICATIONS Jelmar LLC (US) 2026-05-06 EP claimed
EP-4735569-A1 ALKYL SULFONIC ACID COMPOSITIONS COMPRISING SOLVENT USEFUL IN DESCALING APPLICATIONS Jelmar LLC (US) 2026-05-06 EP claimed
US-12532687-B2 Cleaning solution and method of cleaning wafer TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-01-20 US claimed
US-12487527-B2 Photoresist developer and method of developing photoresist TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-12-02 US claimed
US-20250362598-A1 PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-11-27 US claimed
US-12469692-B2 Cleaning solution and method of cleaning wafer TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-11-11 US claimed
US-20250299955-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION METHOD TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-09-25 US claimed
US-12354874-B2 Method of manufacturing semiconductor devices and pattern formation method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-07-08 US claimed
US-20250188390-A1 SUSTAINABLE LAUNDRY SOUR COMPOSITIONS WITH IRON CONTROL ECOLAB USA INC. 2025-06-12 US claimed
CN-118835094-B Method for extracting and refining platinum by using N-methyl sulfamic acid 珠海市金浩宇环保科技有限公司 2025-03-07 CN claimed
WO-1995027703-A1 SUBSTITUTED SULPHONYLAMINOCARBONYLTRIAZOLINONES AND THEIR USE AS HERBICIDES BAYER AKTIENGESELLSCHAFT (DE) 1995-10-19 WO claimed
EP-0664797-A1 SULPHONYL AMINO CARBONYL TRIAZOLINONES. BAYER AG (DE) 1995-08-02 EP claimed
WO-1994008979-A1 SULPHONYL AMINO CARBONYL TRIAZOLINONES BAYER AKTIENGESELLSCHAFT (DE) 1994-04-28 WO claimed
EP-0333656-A1 Reactive dyes, process for their preparation and their use CIBA-GEIGY AG (CH) 1989-09-20 EP claimed
EP-0187456-A1 Cephalosporin derivatives ICI PHARMA (FR) 1986-07-16 EP claimed
US-4546109-A FUNGICIDES; BACTERICIDES; INSECTICIDES; CEREALS; FOOD STORAGE CIBA-GEIGY CORPORATION (US) 1985-10-08 US claimed
EP-0101404-A2 Organotin esters of acrylated aminocarboxylic acids, and their use as pesticides CIBA-GEIGY AG (CH) 1984-02-22 EP claimed
US-4328339-A Continuous preparation of isatoic anhydride BASF AKTIENGESELLSCHAFT (DE) 1982-05-04 US claimed
US-4276433-A Continuous preparation of anthranilic acid BASF AKTIENGESELLSCHAFT (DE) 1981-06-30 US claimed
US-4140684-A FOR POLYESTERS, POLYAMIDES, AND CELLULOSE ACETATES FIDELITY UNION TRUST COMPANY, EXECUTIVE TRUSTEE UNDER THE SANDOZ TRUST (US) 1979-02-20 US claimed