SCHEMBL28338569

SCHEMBL28338569

C[Si](C)(C)N[Si](C)(C)C.C[Si](C)(C)OS(=O)(=O)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL495294 0.85
SCHEMBL2038829 0.73
SCHEMBL30501192 0.72 CA2 (0.33)
SCHEMBL3050172 0.71 USP2 (0.37)
SCHEMBL28445453 0.70
SCHEMBL17491123 0.69 KDM4E (0.33)
SCHEMBL9488059 0.69
SCHEMBL1239715 0.69
Sulfuric Acid SCHEMBL3840186 0.67 CA5A (0.40)
SCHEMBL918810 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110462525-A Surface treatment method and composition for use in said method FUJIFILM ELECTRONIC MAT USA INC 2019-11-15 CN disclosed