⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5891588 | 1.00 | — | — | |
| Acrylic Acid SCHEMBL5471755 | 0.91 | LMNA (0.33) | — | |
| Acrylic Acid SCHEMBL7578205 | 0.91 | LMNA (0.33) | — | |
| SCHEMBL5184534 | 0.82 | GRIK1 (0.42) | — | |
| SCHEMBL2879626 | 0.82 | GRIK1 (0.42) | — | |
| SCHEMBL2138410 | 0.82 | ALDH1A1 (0.31) | — | |
| SCHEMBL21694428 | 0.82 | — | — | |
| SCHEMBL898017 | 0.79 | ALDH1A1 (0.32) | — | |
| SCHEMBL2687798 | 0.79 | GRIK1 (0.45) | — | |
| SCHEMBL2138352 | 0.79 | FFAR3 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114335895-A | Functional layer material for coating lithium ion battery diaphragm | 浙江杰特维新材料有限公司 | 2022-04-12 | — | — | CN | claimed |
| CN-113968929-A | Flame-retardant water-based acrylic composite resin and preparation method thereof | 昆明理工大学 | 2022-01-25 | — | — | CN | claimed |
| CN-108652985-B | Composition for manufacturing dental temporary crown bridge and preparation method thereof | 吉林省登泰克牙科材料有限公司 | 2021-02-19 | — | — | CN | claimed |
| CN-103025846-A | Elastomer-modified crosslinked epoxy vinyl ester particles and methods for making and using the same | 3M INNOVATIVE PROPERTIES CO | 2013-04-03 | — | — | CN | claimed |
| EP-1428492-B1 | Light curing type paint resin for shade adjustment | HERAEUS KULZER GMBH (DE) | 2007-01-17 | — | — | EP | claimed |
| US-5047442-A | Photopolymerizable composition based on a vinyl compound, a sulfur-containing compound and an alpha-diketone | MITSUBISHI RAYON COMPANY LIMITED (JP) | 1991-09-10 | — | — | US | claimed |
| EP-0201903-B1 | PHOTOPOLYMERIZABLE COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 1991-08-07 | — | — | EP | claimed |
| US-4826888-A | STORAGE STABLE, DISCOLORATION INHIBITION | MITSUBISHI RAYON CO., LTD. (JP) | 1989-05-02 | — | — | US | claimed |
| US-4777190-A | Photopolymerizable composition based on a vinyl compound, a sulfur-containing compound and an α-diketone | MITSUBISHI RAYON COMPANY LIMITED (JP) | 1988-10-11 | — | — | US | claimed |
| JP-10330440-A | — | — | None | — | — | JP | disclosed |
| JP-61258802-A | — | — | None | — | — | JP | disclosed |
| JP-61258803-A | — | — | None | — | — | JP | disclosed |
| CN-109752923-B | Photosensitive resin composition | 三星显示有限公司 | 2025-01-17 | — | — | CN | disclosed |
| EP-4364718-A1 | DENTAL CURABLE COMPOSITION | Kuraray Noritake Dental Inc. (JP) | 2024-05-08 | — | — | EP | disclosed |
| EP-0279578-A1 | Moldable thermoplastic polyamide composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-08-24 | — | — | EP | disclosed |
| US-4764447-A | UNSATURATED ESTER MONOMER | RICOH CO., LTD. (JP) | 1988-08-16 | — | — | US | disclosed |
| EP-0239351-A2 | Epoxy(meth)acrylate resin, process for preparing the same and adhesive composition containing the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1987-09-30 | — | — | EP | disclosed |
| EP-0201903-A2 | Photopolymerizable composition | MITSUBISHI RAYON CO., LTD. (JP) | 1986-11-20 | — | — | EP | disclosed |
| JP-S61258802-A | PHOTOPOLYMERIZABLE COMPOSITION | MITSUBISHI RAYON CO LTD | 1986-11-17 | — | — | JP | disclosed |
| JP-S61258803-A | PHOTOPOLYMERIZABLE COMPOSITION | MITSUBISHI RAYON CO LTD | 1986-11-17 | — | — | JP | disclosed |