SCHEMBL28344832

SCHEMBL28344832

Cc1ccc2sc3ccccc3c(=S)c2c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 1/20 0.46
ALDH1A1 P00352 7/20 0.42
MAPT P10636 9/20 0.41
RAB9A P51151 5/20 0.41
SMN1; SMN2 Q16637 4/20 0.41
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
NPC1 O15118 3/20 0.41
KDM4E B2RXH2 5/20 0.39
L3MBTL1 Q9Y468 4/20 0.39
TDP1 Q9NUW8 1/20 0.39
HPGD P15428 3/20 0.39
POLB P06746 2/20 0.37
MAOB P27338 1/20 0.37
LMNA P02545 3/20 0.37
GAA P10253 2/20 0.37
HTT P42858 1/20 0.37
PMM2 O15305 1/20 0.36
MPI P34949 1/20 0.36
PHOSPHO1 Q8TCT1 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL257003 0.84 GPR3 (0.61) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL9129456 0.82 GPR3 (0.68) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL15785768 0.81 GPR3 (0.56) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
Hydrochloric Acid SCHEMBL29008118 0.80 GPR3 (0.65) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL6130182 0.79 GPR3 (0.54) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL28457674 0.78 KDM4E (0.64) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL82771 0.78 KDM4E (0.64) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL1285223 0.78 KDM4E (0.64) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL29554901 0.78 KDM4E (0.64) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2
SCHEMBL29357310 0.78 KDM4E (0.64) GPR3ALDH1A1MAPTRAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115885011-A Resin composition and film 凸版印刷株式会社 2023-03-31 CN disclosed
CN-111527130-B Resin composition, cured product thereof, adhesive, semiconductor device, and electronic component 纳美仕有限公司 2023-03-28 CN disclosed
CN-115826353-A Photosensitive resin composition, dry film comprising same, and printed wiring board comprising cured product of same 株式会社田村制作所 2023-03-21 CN disclosed
CN-115536841-A Negative photosensitive resin and preparation method and application thereof 广东粤港澳大湾区黄埔材料研究院 2022-12-30 CN disclosed
CN-115551915-A Polymerizable unsaturated group-containing alkali-soluble resin and method for producing same, and photosensitive resin composition and cured product thereof 日铁化学材料株式会社 2022-12-30 CN disclosed
CN-115480449-A Curable composition, cured product, and method for producing cured product 东京应化工业株式会社 2022-12-16 CN disclosed
CN-115243731-A Anti-pathogenic structures, methods for producing anti-pathogenic structures, apparatus and liquid compositions for producing anti-pathogenic structures 株式会社理光 2022-10-25 CN disclosed
CN-115141552-A Adhesive layer forming composition, laminate, method for producing laminate, and method for treating laminate 日铁化学材料株式会社 2022-10-04 CN disclosed
CN-112154067-B Antifogging laminate and method for producing antifogging laminate 富士胶片株式会社 2022-09-30 CN disclosed
CN-110239217-B Liquid discharge device 株式会社理光 2022-09-20 CN disclosed
CN-111698980-A Microcapsules having a porous or hollow core and a pH-sensitive shell and uses thereof 3M创新有限公司 2020-09-22 CN disclosed
CN-111492508-A Electrode, method for producing same, electrode element, and nonaqueous electrolyte storage element 株式会社理光 2020-08-04 CN disclosed
CN-111378199-A Liquid composition, storage container, porous resin production apparatus and method thereof 株式会社理光 2020-07-07 CN disclosed
CN-111183010-A Mold release film for molding and molding method 东丽薄膜先端加工股份有限公司 2020-05-19 CN disclosed
CN-111149056-A Photosensitive conductive paste and film for forming conductive pattern 东丽株式会社 2020-05-12 CN disclosed
CN-111051060-A Mold release film 东丽薄膜先端加工股份有限公司 2020-04-21 CN disclosed
CN-104423154-B Gate insulating film, organic thin film transistor, and method for manufacturing organic thin film transistor 日铁化学材料株式会社 2020-03-10 CN disclosed
CN-104823108-B Negative photosensitive resin composition, resin cured film, partition wall, and optical element AGC株式会社 2020-02-21 CN disclosed
CN-110678160-A Dental adhesive composition, its preparation and use 3M创新有限公司 2020-01-10 CN disclosed
CN-104252101-B Film-forming composition 东京应化工业株式会社 2019-12-20 CN disclosed