SCHEMBL28347494

SCHEMBL28347494

Cc1cc(N)c(C(=O)O)cc1N

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.50
TDP1 Q9NUW8 4/20 0.50
KMT2A Q03164 3/20 0.50
CYP3A4 P08684 3/20 0.50
MEN1 O00255 2/20 0.50
TSHR P16473 1/20 0.50
MAPK1 P28482 1/20 0.50
IDO1 P14902 1/20 0.50
GLA P06280 1/20 0.50
GFER P55789 1/20 0.48
RXFP1 Q9HBX9 1/20 0.48
GABRP O00591 1/20 0.47
GABRD O14764 1/20 0.47
GABRA1 P14867 1/20 0.47
GABRB1 P18505 1/20 0.47
GABRG2 P18507 1/20 0.47
GABRB3 P28472 1/20 0.47
GABRA5 P31644 1/20 0.47
GABRA3 P34903 1/20 0.47
GABRA2 P47869 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13365081 0.91 KDM4E (0.50) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL2813599 0.88 KDM4E (0.52) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL30079667 0.88 KDM4E (0.52) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL974647 0.88 KDM4E (0.52) KDM4ETDP1KMT2ACYP3A4MEN1
Hydrochloric Acid SCHEMBL9388380 0.86 KMT2A (0.52) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL2892593 0.86 GABRP (0.52) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL2810184 0.86 KDM4E (0.50) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL4732592 0.86 GABRP (0.52) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL2807685 0.86 KDM4E (0.50) KDM4ETDP1KMT2ACYP3A4MEN1
SCHEMBL30280663 0.86 GABRP (0.52) KDM4ETDP1KMT2ACYP3A4MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120202243-A Thermosetting resin composition, cured film, substrate, and electronic component 捷恩智株式会社 2025-06-24 CN disclosed
WO-2024150597-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, SUBSTRATE, AND ELECTRONIC COMPONENT JNC株式会社 2024-07-18 WO disclosed
CN-110534699-B Preparation method of lithium ion battery negative plate 江苏大毛牛新材料有限公司 2021-07-13 CN disclosed
CN-110534699-A A kind of preparation method of anode plate for lithium ionic cell LI JINDI 2019-12-03 CN disclosed