SCHEMBL28372018

SCHEMBL28372018

CCOC(CC[Si](OC)(OC)OC)(OCC)OCC

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28399870 0.84
SCHEMBL10639432 0.77 LMNA (0.31) LMNA
SCHEMBL969825 0.76 HPGD (0.31)
SCHEMBL7693689 0.75
SCHEMBL20202333 0.74 LMNA (0.35) LMNA
SCHEMBL20202331 0.73 LMNA (0.37) LMNA
SCHEMBL28478084 0.72
SCHEMBL5419900 0.71 LMNA (0.32) LMNA
SCHEMBL4534537 0.70 ALDH1A1 (0.47)
SCHEMBL5832431 0.69 CYP2C19 (0.32) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113644247-B Method for preparing high-capacity high-rate nano silicon/SiO negative electrode composite material for lithium battery negative electrode at low cost and material 成都硅宝科技股份有限公司 2022-12-06 CN claimed
CN-113644247-B Method for preparing high-capacity high-rate nano silicon/SiO negative electrode composite material for lithium battery negative electrode at low cost and material 成都硅宝科技股份有限公司 2022-12-06 CN disclosed
CN-108291132-B Etching composition and method for manufacturing semiconductor device using the same 秀博瑞殷株式公社 2022-01-14 CN disclosed
CN-107075302-B Film-forming composition containing crosslinking reactive silicon 日产化学工业株式会社 2020-08-04 CN disclosed
CN-111427235-A Photoresist material, color filter and display device TCL华星光电技术有限公司 2020-07-17 CN disclosed
CN-111240155-A Photoresist material, color filter and display device TCL华星光电技术有限公司 2020-06-05 CN disclosed
CN-104737076-B Composition for forming silicon-containing resist underlayer film having ester group 日产化学工业株式会社 2020-04-03 CN disclosed