Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR1B | P28222 | 11/20 | 0.44 |
| ▸ | HTR1D | P28221 | 3/20 | 0.43 |
| ▸ | CNR1 | P21554 | 1/20 | 0.42 |
| ▸ | CNR2 | P34972 | 1/20 | 0.42 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.40 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.40 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.39 |
| ▸ | HRH1 | P35367 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15345299 | 0.82 | HTR1B (0.46) | HTR1BHTR1DCNR1CNR2TLR8 | |
| SCHEMBL28371895 | 0.78 | HTR1B (0.46) | HTR1BHTR1DCNR1CNR2TLR8 | |
| SCHEMBL10634196 | 0.77 | HTR1B (0.51) | HTR1BHTR1DCNR1CNR2TLR8 | |
| SCHEMBL31080864 | 0.77 | HTR1B (0.51) | HTR1BHTR1DCNR1CNR2TLR8 | |
| SCHEMBL9505803 | 0.76 | ALDH1A1 (0.46) | CNR1CNR2NCEH1 | |
| SCHEMBL7915225 | 0.76 | ALDH1A1 (0.61) | NCEH1 | |
| SCHEMBL15859168 | 0.75 | HTR1B (0.49) | HTR1BHTR1DCNR1CNR2TLR8 | |
| Naphthalene SCHEMBL28061167 | 0.75 | CNR1 (0.51) | HTR1BHTR1DCNR1CNR2TLR8 | |
| SCHEMBL2116954 | 0.74 | HTR1B (0.70) | HTR1BHTR1DCNR1CNR2SLC6A4 | |
| SCHEMBL30209610 | 0.74 | HTR1B (0.70) | HTR1BHTR1DCNR1CNR2SLC6A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106970503-B | Photosensitive composition | 东京应化工业株式会社 | 2022-02-01 | — | — | CN | disclosed |
| CN-112394617-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2021-02-23 | — | — | CN | disclosed |
| CN-111240156-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-06-05 | — | — | CN | disclosed |
| CN-110955114-A | Photosensitive resin composition, method for producing patterned cured film, and cured film | 东京应化工业株式会社 | 2020-04-03 | — | — | CN | disclosed |