SCHEMBL28376304

SCHEMBL28376304

CC(=O)Oc1cc2c(=O)c3ccccc3sc2cc1C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTT P42858 2/20 0.50
▸ MAPT P10636 8/20 0.49
▸ ALDH1A1 P00352 7/20 0.49
▸ KDM4E B2RXH2 6/20 0.49
▸ GAA P10253 4/20 0.49
▸ NPC1 O15118 3/20 0.49
▸ RAB9A P51151 3/20 0.49
▸ POLB P06746 2/20 0.49
▸ L3MBTL1 Q9Y468 2/20 0.49
▸ MEN1 O00255 2/20 0.49
▸ KMT2A Q03164 2/20 0.49
▸ TDP1 Q9NUW8 1/20 0.49
▸ HCRTR1 O43613 2/20 0.47
▸ LMNA P02545 1/20 0.47
▸ HSD17B10 Q99714 2/20 0.43
▸ TP53 P04637 1/20 0.43
▸ ACHE P22303 1/20 0.41
▸ HPGD P15428 3/20 0.40
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ CYP1A2 P05177 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31120478 0.85 MAPT (0.45) HTTMAPTALDH1A1KDM4EGAA
SCHEMBL1042361 0.83 MAPT (0.61) MAPTALDH1A1KDM4EGAANPC1
SCHEMBL13671569 0.82 HTT (0.47) HTTMAPTALDH1A1KDM4EGAA
SCHEMBL8527804 0.79 KDM4E (0.59) MAPTALDH1A1KDM4EGAANPC1
SCHEMBL30612336 0.79 KDM4E (0.59) MAPTALDH1A1KDM4EGAANPC1
SCHEMBL3233829 0.79 MAPT (0.68) MAPTALDH1A1KDM4EGAANPC1
SCHEMBL30998124 0.79 MAPT (0.68) MAPTALDH1A1KDM4EGAANPC1
SCHEMBL27660054 0.79 MAPT (0.56) MAPTALDH1A1KDM4EGAANPC1
SCHEMBL24947941 0.77 ALDH1A1 (0.43) MAPTALDH1A1KDM4EGAANPC1
SCHEMBL30162025 0.77 ALDH1A1 (0.64) MAPTALDH1A1KDM4EGAANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 — — CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 — — CN disclosed
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 — — CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 — — CN disclosed
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 — — CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 — — CN disclosed
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